706493
(3-氨基丙基)三乙氧基硅烷
packaged for use in deposition systems, ≥98%
别名:
3-氨丙基三乙氧基硅烷, APTES, APTS
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关于此项目
线性分子式:
H2N(CH2)3Si(OC2H5)3
化学文摘社编号:
分子量:
221.37
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
EC Number:
213-048-4
Beilstein/REAXYS Number:
1754988
MDL number:
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signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1B - Skin Sens. 1
存储类别
8A - Combustible corrosive hazardous materials
wgk
WGK 1
flash_point_f
199.4 °F - closed cup
flash_point_c
93 °C - closed cup
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.
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The restriction endonuclease EcoRV can rapidly locate a short recognition site within long non-cognate DNA using 'facilitated diffusion'. This process has long been attributed to a sliding mechanism, in which the enzyme first binds to the DNA via nonspecific interaction
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Nature communications, 6, 6111-6111 (2015-01-23)
The closure of gaps within epithelia is crucial to maintain its integrity during biological processes such as wound healing and gastrulation. Depending on the distribution of extracellular matrix, gap closure occurs through assembly of multicellular actin-based contractile cables or protrusive
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We prepared novel Fe(3)O(4) magnetic nanoparticles (MNPs) modified with 3-aminopropyltriethoxysilane (APS) and copolymers of acrylic acid (AA) and crotonic acid (CA). The MNPs were characterized by transmission electron microscopy, X-ray diffraction, infra-red spectra and thermogravimetric analysis. We explored the ability
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 706493-20ML | 04061838148155 |