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Merck
CN

440108

Sigma-Aldrich

三氯苯硅烷

≥97.0%

别名:

苯基三氯硅烷

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About This Item

线性分子式:
C6H5SiCl3
CAS号:
分子量:
211.55
EC 号:
MDL编号:
UNSPSC代码:
12352100
PubChem化学物质编号:
NACRES:
NA.21

质量水平

方案

≥97.0%

表单

liquid

折射率

n20/D 1.523 (lit.)

沸点

201 °C (lit.)

密度

1.321 g/mL at 25 °C (lit.)

SMILES字符串

Cl[Si](Cl)(Cl)c1ccccc1

InChI

1S/C6H5Cl3Si/c7-10(8,9)6-4-2-1-3-5-6/h1-5H

InChI key

ORVMIVQULIKXCP-UHFFFAOYSA-N

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相关类别

一般描述

三氟(苯基)硅烷可与脂肪醇反应生成苯、烷氧基氟和四烷氧基硅烷。该硅烷在其气相下发生的水解缩合导致 1,1,3,3-四氯-1,3-二苯基二硅氧烷的形成。

象形图

CorrosionExclamation mark

警示用语:

Danger

危险声明

危险分类

Acute Tox. 4 Dermal - Eye Dam. 1 - Skin Corr. 1A

补充剂危害

储存分类代码

8A - Combustible corrosive hazardous materials

WGK

WGK 1

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

法规信息

危险化学品

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分析证书(COA)

Lot/Batch Number

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Qian Wu et al.
Journal of hazardous materials, 336, 222-231 (2017-05-12)
In this study, a novel strategy was developed to fabricate highly flame retardant polymer foam composite materials coated by synthesized silicone resin (SiR) polymer via a facile dip-coating processing. Applying the SiR polymer coating, the mechanical property and thermal stability
Syntheses and structural analyses of 1, 3-diphenyldisiloxanes as a building block of silsesquioxanes.
Bulletin of the Chemical Society of Japan, 76(10), 1983-19887 (2003)
Cleavage of the C-Si bond in Trifluoro (phenyl) silane with Aliphatic Alcohols.
Russ. J. Gen. Chem., 75(12), 1927-1929 (2005)
Xiaona Wen et al.
Bioengineering & translational medicine, 5(3), e10165-e10165 (2020-10-03)
Precise monitoring of specific biomarkers in biological fluids with accurate biodiagnostic sensors is critical for early diagnosis of diseases and subsequent treatment planning. In this work, we demonstrated an innovative biodiagnostic sensor, portable reusable accurate diagnostics with nanostar antennas (PRADA)
Phillip C Chambers et al.
Beilstein journal of nanotechnology, 9, 1211-1219 (2018-05-17)
Nanostructures of 4-(chloromethyl)phenyltrichlorosilane (CMPS) were used as a foundation to attach and grow heterostructures of porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with

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