推荐产品
蒸汽压
0.03 mmHg ( 40 °C)
质量水平
检测方案
98%
反应适用性
core: iron
reagent type: catalyst
bp
249 °C (lit.)
mp
172-174 °C (lit.)
λmax
358 nm
储存温度
2-8°C
SMILES字符串
[Fe].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2
InChI
1S/2C5H5.Fe/c2*1-2-4-5-3-1;/h2*1-5H;
InChI key
DFRHTHSZMBROSH-UHFFFAOYSA-N
正在寻找类似产品? 访问 产品对比指南
应用
二茂铁（二环戊二烯基铁）可用于：
- 用作不对称催化中的手性配体支架。
- 染料敏化太阳能电池应用中的二茂铁基电解质。
- 合成不对称二茂铁配体，可用作交叉偶联、氢化、烯丙基取代的催化剂。
- 通过化学气相沉积法合成二维六方有序介孔碳（CMK-5），用作甲醇氧化的催化剂载体。
- 合成二茂铁与富勒烯的分子杂化物（巴基二茂铁）。
- 制备二茂铁盐，用作温和氧化剂。
警示用语：
Danger
危险分类
Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 1 - Flam. Sol. 1 - Repr. 1B - STOT RE 2 Inhalation
靶器官
Liver
WGK
WGK 2
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Eyeshields, Gloves, type P3 (EN 143) respirator cartridges
Micheál D Scanlon et al.
Physical chemistry chemical physics : PCCP, 15(8), 2847-2857 (2013-01-23)
Rarely reported low-cost molybdenum boride and carbide microparticles, both of which are available in abundant quantities due to their widespread use in industry, adsorb at aqueous acid-1,2-dichloroethane interfaces and efficiently catalyse the hydrogen evolution reaction in the presence of the
Lanti Yang et al.
Journal of the American Chemical Society, 134(46), 19199-19206 (2012-11-07)
Adopting supramolecular chemistry for immobilization of proteins is an attractive strategy that entails reversibility and responsiveness to stimuli. The reversible and oriented immobilization and micropatterning of ferrocene-tagged yellow fluorescent proteins (Fc-YFPs) onto β-cyclodextrin (βCD) molecular printboards was characterized using surface
CMK-5 mesoporous carbon synthesized via chemical vapor deposition of ferrocene as catalyst support for methanol oxidation
Lei Z, et al.
The Journal of Physical Chemistry C, 3(112), 722-731 (2008)
Asymmetric catalysis with chiral ferrocene ligands
Dai LX, et al.
Accounts of Chemical Research, 36(9), 659-667 (2003)
The syntheses and catalytic applications of unsymmetrical ferrocene ligands
Atkinson RCJ, et al.
Chemical Society Reviews, 33(33), 313-328 (2004)
商品
近十年来出现了原子层沉积（ALD）技术以满足各种需求，包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系技术服务部门