920126
Graphene, monolayer film
4 in diameter, CVD on silicon wafer, large grain, avg. no. of layers, 1
别名:
Roll-to-Roll graphene
产品名称
R2R Monolayer large grain CVD graphene on silicon wafer, 4 in diameter, avg. no. of layers, 1
SMILES string
NC.NC.NC.NC.NC.NC.NC.NC.NC
InChI key
DXIFQVRACSPGSU-UHFFFAOYSA-N
description
Growth method: roll-to-roll CVD
Wafer: SiO2 (300nm) Si
Number of layer: Monolayer
Raman intensity 2D/G: ≥1.5
feature
avg. no. of layers 1
sheet resistance
280 Ω/sq ±10%
size
110 μm × 110 μm ± 10% , grain size
surface coverage
surface coverage >98%
transmittance
>97%
semiconductor properties
(mobility>3000 cm2/V·s) (Hall effect measurements)
Quality Level
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Application
Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
- Ultrafast Transistor
- Optical devices
- Bio/Gas Sensor
- Transparent Electrode
- Flexible Display
- Smart Coating
- Thermal management
Disclaimer
Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.
Keep away from contamination, heat, dust and flame etc.
General description
Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on 4 inch silicon wafer.
Legal Information
Product of LG Electronics, R&D use only
Preparation Note
Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.
存储类别
11 - Combustible Solids
wgk
WGK 3
法规信息
新产品
此项目有
Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Hao-Ling Tang et al.
ACS nano, 11(12), 12817-12823 (2017-11-29)
Two-dimensional (2D) materials are drawing growing attention for next-generation electronics and optoelectronics owing to its atomic thickness and unique physical properties. One of the challenges posed by 2D materials is the large source/drain (S/D) series resistance due to their thinness
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain
商品
Review on 1D vdWHs: Discusses materials, synthesis, optoelectronic applications, challenges, and future perspectives for 1D vdWH-based devices.
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