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质量水平
描述
Growth method: roll-to-roll CVD
Raman intensity 2D/G: ≥1.5
Number of layer: Monolayer
特点
avg. no. of layers 1
薄层电阻
280 Ω/sq ±10%
尺寸
110 μm × 110 μm ± 10%, grain size
厚度
35 μm , Cu Foil
表面覆盖度
surface coverage >98%
透射比
>97%
半导体性质
(mobility>3000 cm2/V·s) (Hall effect measurements)
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一般描述
Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on copper foil, A5 size.
应用
Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
- Ultrafast Transistor
- Optical devices
- Bio/Gas Sensor
- Transparent Electrode
- Flexible Display
- Smart Coating
- Thermal management
注意
Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.
Keep away from contamination, heat, dust and flame etc.
储存及稳定性
Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.
法律信息
Product of LG Electronics, R&D use only
警示用语：
Warning
危险声明
预防措施声明
危险分类
Aquatic Acute 1 - Aquatic Chronic 1
WGK
WGK 2
法规信息
新产品
Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Hao-Ling Tang et al.
ACS nano, 11(12), 12817-12823 (2017-11-29)
Two-dimensional (2D) materials are drawing growing attention for next-generation electronics and optoelectronics owing to its atomic thickness and unique physical properties. One of the challenges posed by 2D materials is the large source/drain (S/D) series resistance due to their thinness
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain
商品
Review on 1D vdWHs: Discusses materials, synthesis, optoelectronic applications, challenges, and future perspectives for 1D vdWH-based devices.
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