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Merck
CN

87921

Sigma-Aldrich

四甲基硅烷

≥99.0% (GC)

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别名:
TMS
线性分子式:
Si(CH3)4
CAS号:
分子量:
88.22
Beilstein:
1696908
EC 号:
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.22

蒸汽压

11.66 psi ( 20 °C)

质量水平

检测方案

≥99.0% (GC)

形式

liquid

自燃温度

842 °F

折射率

n20/D 1.358 (lit.)
n20/D 1.359

bp

26-28 °C (lit.)

mp

−99 °C (lit.)

密度

0.648 g/mL at 25 °C (lit.)

储存温度

2-8°C

SMILES字符串

C[Si](C)(C)C

InChI

1S/C4H12Si/c1-5(2,3)4/h1-4H3

InChI key

CZDYPVPMEAXLPK-UHFFFAOYSA-N

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应用

四甲基硅烷可用作合成硅掺杂类金刚石碳基(DLC-Si)薄膜和碳化硅(SiC)块状晶体的硅前体。还可用作研究分子间C-H键活化反应的烃类底物。

象形图

Flame

警示用语:

Danger

危险声明

预防措施声明

危险分类

Flam. Liq. 1

WGK

WGK 3

闪点(°F)

-16.6 °F

闪点(°C)

-27 °C

个人防护装备

Eyeshields, Faceshields, Gloves

法规信息

危险化学品

分析证书(COA)

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The mechanical and biocompatibility properties of DLC-Si films prepared by pulsed DC plasma activated chemical vapor deposition.
Bendavid A, et al.
Diamond and Related Materials, 16(8), 1616-1622 (2007)
High-temperature chemical vapor deposition for SiC single crystal bulk growth using tetramethylsilane as a precursor.
Nam DH, et al.
Crystal Growth & Design, 14(11), 5569-5574 (2014)
The effects of Si incorporation on the electrochemical and nanomechanical properties of DLC thin films.
Papakonstantinou P, et al.
Diamond and Related Materials, 11(3-6), 1074-1080 (2002)
Intermolecular C- H Activation of Hydrocarbons by Tungsten Alkylidene Complexes: An Experimental and Computational Mechanistic Study.
Adams CS, et al.
Organometallics, 20(23), 4939-4955 (2001)
Jose C Pichardo et al.
Journal of nuclear medicine : official publication, Society of Nuclear Medicine, 52(9), 1482-1489 (2011-07-30)
The current gold standard for measuring marrow cellularity is the bone marrow (BM) biopsy of the iliac crest. This measure is not predictive of total marrow cellularity, because the biopsy volume is typically small and fat fraction varies across the

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