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Merck
CN

666610

Sigma-Aldrich

四(二甲基氨基)铪 (Ⅳ)

packaged for use in deposition systems

别名:

TDMAH, 四(二甲胺基)铪(IV)

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About This Item

线性分子式:
[(CH3)2N]4Hf
CAS号:
分子量:
354.79
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.23

质量水平

检测方案

≥99.99% (trace metals analysis)

形式

low-melting solid

反应适用性

core: hafnium

mp

26-29 °C (lit.)

密度

1.098 g/mL at 25 °C

SMILES字符串

CN(C)[Hf](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

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一般描述

铪烷基酰胺是制备平滑非晶氧化铪薄膜的一种简便有效的原子层沉积前驱体。

应用

用作氧化铪纳米层压板的原子层沉积的前体,其用作半导体器件中的氧化硅的替换物。

象形图

FlameCorrosion

警示用语:

Danger

危险声明

危险分类

Flam. Sol. 1 - Skin Corr. 1B - Water-react 2

补充剂危害

WGK

WGK 3

闪点(°F)

109.4 °F

闪点(°C)

43 °C

个人防护装备

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


分析证书(COA)

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  4. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  5. Can the empty deposition cylinders be refilled?

    Yes, we are able to refill these cylinders through our SAFC Hitech group.  Please contact our Technical Service department by email at techserv@sial.com, and they will forward you to the appropriate SAFC Hitech representative for a quote.

  6. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Hausmann DM, Gordon RG
Journal of Crystal Growth, 249, 251-261 (2003)
High Purity Metalorganic Precursors for CPV Device Fabrication
Rushworth S
Material Matters, 5(4) null
Applied Physics Letters, 91, 193503-193503 (2007)
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition
Monsma D, Becker J
Material Matters, 1(3), 5-5 (2006)

商品

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

High Purity Metalorganic Precursors for CPV Device Fabrication

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

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