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Merck
CN

666610

四(二甲基氨基)铪 (Ⅳ)

packaged for use in deposition systems

别名:

TDMAH, 四(二甲胺基)铪(IV)

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关于此项目

线性分子式:
[(CH3)2N]4Hf
化学文摘社编号:
分子量:
354.79
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
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产品名称

四(二甲基氨基)铪 (Ⅳ), packaged for use in deposition systems

InChI

1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

SMILES string

CN(C)[Hf](N(C)C)(N(C)C)N(C)C

InChI key

ZYLGGWPMIDHSEZ-UHFFFAOYSA-N

assay

≥99.99% (trace metals analysis)

form

low-melting solid

reaction suitability

core: hafnium

mp

26-29 °C (lit.)

density

1.098 g/mL at 25 °C

Quality Level

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Application

用作氧化铪纳米层压板的原子层沉积的前体,其用作半导体器件中的氧化硅的替换物。

General description

铪烷基酰胺是制备平滑非晶氧化铪薄膜的一种简便有效的原子层沉积前驱体。

pictograms

FlameCorrosion

signalword

Danger

Hazard Classifications

Flam. Sol. 1 - Skin Corr. 1B - Water-react 2

supp_hazards

存储类别

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk

WGK 3

flash_point_f

109.4 °F - closed cup

flash_point_c

43 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


历史批次信息供参考:

分析证书(COA)

Lot/Batch Number

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

  2. How do I get lot-specific information or a Certificate of Analysis?

    The lot specific COA document can be found by entering the lot number above under the "Documents" section.

  3. How do I find price and availability?

    There are several ways to find pricing and availability for our products. Once you log onto our website, you will find the price and availability displayed on the product detail page. You can contact any of our Customer Sales and Service offices to receive a quote.  USA customers:  1-800-325-3010 or view local office numbers.

  4. What is the Department of Transportation shipping information for this product?

    Transportation information can be found in Section 14 of the product's (M)SDS.To access the shipping information for this material, use the link on the product detail page for the product. 

  5. Can the empty deposition cylinders be refilled?

    Yes, we are able to refill these cylinders through our SAFC Hitech group.  Please contact our Technical Service department by email at techserv@sial.com, and they will forward you to the appropriate SAFC Hitech representative for a quote.

  6. My question is not addressed here, how can I contact Technical Service for assistance?

    Ask a Scientist here.

Applied Physics Letters, 91, 193503-193503 (2007)
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Hausmann DM, Gordon RG
Journal of Crystal Growth, 249, 251-261 (2003)
High Purity Metalorganic Precursors for CPV Device Fabrication
Rushworth S
Material Matters, 5(4) null
The Savannah ALD System - An Excellent Tool for Atomic Layer Deposition
Monsma D, Becker J
Material Matters, 1(3), 5-5 (2006)

商品

High Purity Metalorganic Precursors for CPV Device Fabrication

Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition

Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.

The properties of many devices are limited by the intrinsic properties of the materials that compose them.

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