storage temp.
2-8°C
Quality Level
Application
Aldrich®负性光致抗蚀剂套装I已被用于通过光刻法制造微电极。它还可用于制造基于液滴的微流控器件、微流控芯片、玻璃光波导和集成光栅耦合器。
General description
Aldrich®负性光致抗蚀剂套装I由用于光蚀刻的材料组成。该光致抗蚀剂可旋涂于玻璃基质上以形成电极阵列。该套装还可用于在玻璃表面上进行掩膜和成像。
Legal Information
Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
signalword
Danger
Hazard Classifications
Acute Tox. 4 Dermal - Acute Tox. 4 Inhalation - Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Repr. 1B - Skin Corr. 1 - STOT RE 2 Inhalation - STOT SE 3
target_organs
Central nervous system,Liver,Kidney, Respiratory system
存储类别
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
flash_point_f
Not applicable
flash_point_c
Not applicable
法规信息
危险化学品
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实验方案
Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.
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