所有图片(1)
About This Item
线性分子式:
C7H9RuC7H9
CAS号:
分子量:
287.36
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.23
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表单
liquid
质量水平
组成
Ru, 33.9-36.4% gravimetric
反应适用性
core: ruthenium
reagent type: catalyst
折射率
n20/D 1.5870 (lit.)
沸点
100 °C/0.01 mmHg (lit.)
mp
6 °C (lit.)
密度
1.3412 g/mL at 25 °C (lit.)
储存温度
−20°C
SMILES字符串
[Ru].CC[C]1[CH][CH][CH][CH]1.CC[C]2[CH][CH][CH][CH]2
InChI
1S/2C7H9.Ru/c2*1-2-7-5-3-4-6-7;/h2*3-6H,2H2,1H3;
InChI key
VLTZUJBHIUUHIK-UHFFFAOYSA-N
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应用
双（乙基环戊二烯基）钌（II）（Ru（EtCp）2），一种金属有机物，可用作Ru薄膜和排列一致的RuO2纳米棒的原子层沉积前体。
警示用语：
Warning
危险声明
危险分类
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
靶器官
Respiratory system
储存分类代码
10 - Combustible liquids
WGK
WGK 3
闪点(°F)
>199.9 °F - closed cup
闪点(°C)
> 93.3 °C - closed cup
个人防护装备
Eyeshields, Gloves, type ABEK (EN14387) respirator filter
Thermal atomic layer deposition (ALD) of Ru films for Cu direct plating.
Choi SH, et al.
Journal of the Electrochemical Society, 158(6), D351-D356 (2011)
ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems.
Waechtler T, et al.
Microelectronic Engineering, 88(5), 684-689 (2011)
Growth and characterization of the coexistence of vertically aligned and twinned V-shaped RuO2 nanorods on nanostructural TiO2 template
Chen CA, et al.
J. Alloy Compounds, 485(1-2), 524-528 (2009)
In-situ real-time ellipsometric investigations during the atomic layer deposition of ruthenium: A process development from [(ethylcyclopentadienyl)(pyrrolyl) ruthenium] and molecular oxygen.
Knaut M, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 30(1), 01A151-01A151 (2012)
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