496863
五（二甲基氨基）钽（V）
99.99%
别名:
PDMAT, TADMA, Ta(NMe2)5, 钽二甲基胺
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关于此项目
线性分子式:
Ta(N(CH3)2)5
化学文摘社编号:
分子量:
401.33
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
产品名称
五（二甲基氨基）钽（V）, 99.99%
InChI
1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5
SMILES string
CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C
InChI key
VSLPMIMVDUOYFW-UHFFFAOYSA-N
assay
99.99%
form
solid
reaction suitability
core: tantalum
reagent type: catalyst
mp
100 °C (dec.) (lit.)
Quality Level
General description
基材原子数：73 钽
Features and Benefits
氮化钽 (TaN) 薄膜的挥发性固体 CVD 前体。当在沉积过程中存在 O2、H2O、NO 或 H2O2 时，还会形成氧化钽 (Ta2O5) 薄膜。 Ta2O5 薄膜作为集成电路制造中的栅电介质材料具有广阔的应用前景。
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1
存储类别
4.3 - Hazardous materials which set free flammable gases upon contact with water
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume
商品
High Purity Metalorganic Precursors for CPV Device Fabrication
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