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Merck
CN

469858

四(二甲基胺基)钛(IV)

99.999% trace metals basis

别名:

TDMAT, 四(二甲基氨基)钛(IV)

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关于此项目

线性分子式:
[(CH3)2N]4Ti
化学文摘社编号:
3275-24-9
分子量:
224.17
NACRES:
NA.23
PubChem Substance ID:
24870618
UNSPSC Code:
12352103
EC Number:
221-904-3
MDL number:
MFCD00014861

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产品名称

四(二甲基胺基)钛(IV), 99.999% trace metals basis

InChI key

MNWRORMXBIWXCI-UHFFFAOYSA-N

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

SMILES string

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

assay

99.999% trace metals basis

form

liquid

reaction suitability

core: titanium

bp

50 °C/0.5 mmHg (lit.)

density

0.947 g/mL at 25 °C (lit.)

Quality Level

200

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Application

Tetrakis（二甲基氨基）钛（IV）（TDMAT）是通过有机金属化学气相沉积（OMCVD）和通过原子层沉积（ALD）的二氧化钛薄膜的氮化钛（TiN）薄膜的前体。TDMAT 与过量的环戊二烯发生放热反应得到三（二甲基氨基）（η5-环戊二烯基）钛（IV）。

General description

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Features and Benefits

  • 99.999% trace metals basis ensures superior quality of deposited films, with minimal defects and consistent properties, critical for microelectronics and optoelectronics applications.
  • High purity reduces the risk of contamination during the coating process, leading to enhanced adhesion, durability, and performance of the final products.
  • The absence of impurities allows for the precise control of particle size and morphology, improving the effectiveness of nanoparticles in targeted applications.
  • High purity ensures that electronic properties are not compromised by impurities, enhancing device performance and reliability.
  • Controlling heavy metals at ppb levels ensures effective contamination control, regulatory compliance, and optimized performance.

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

Hazard Classifications

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

supp_hazards

EUH014

存储类别

4.3 - Hazardous materials which set free flammable gases upon contact with water

wgk

WGK 3

flash_point_f

-22.0 °F - closed cup

flash_point_c

-30 °C - closed cup

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

法规信息

危险化学品
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历史批次信息供参考:

分析证书(COA)

Lot/Batch Number
SHBT4988
SHBT1500
SHBS9659
SHBS2053
SHBP1947

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Microstructure and elastic properties of atomic layer deposited TiO 2 anatase thin films.
Borgese L, et al.
Acta Materialia, 59(7), 2891-2900 (2011)
Tianshuo Zhao et al.
Proceedings of the National Academy of Sciences of the United States of America, 118(7) (2021-02-10)
Semiconductors of narrow bandgaps and high quantum efficiency have not been broadly utilized for photocatalytic coevolution of H2 and O2 via water splitting. One prominent issue is to develop effective protection strategies, which not only mitigate photocorrosion in an aqueous
Young modulus and Poisson ratio measurements of TiO 2 thin films deposited with atomic layer deposition.
Borgese L, et al.
Surface and Coatings Technology, 206(8), 2459-2463 (2012)
Degao Wang et al.
Proceedings of the National Academy of Sciences of the United States of America, 115(34), 8523-8528 (2018-08-08)
Stabilized photoanodes for light-driven water oxidation have been prepared on nanoparticle core/shell electrodes with surface-stabilized donor-acceptor chromophores, a water oxidation catalyst, and an electron-transfer mediator. For the electrode, fluorine-doped tin oxide FTO|SnO2/TiO2|-Org1-|1.1 nm Al2O3|-RuP2+-WOC (water oxidation catalyst) with Org1 (1-cyano-2-(4-(diphenylamino)phenyl)vinyl)phosphonic
Improving performance via blocking layers in dye-sensitized solar cells based on nanowire photoanodes.
Li L, et al.
ACS Applied Materials & Interfaces, 7(23), 12824-12831 (2015)
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