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安全信息

469858

Sigma-Aldrich

四(二甲基胺基)钛(IV)

99.999% trace metals basis

别名:

TDMAT, 四(二甲基氨基)钛(IV)

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About This Item

线性分子式:
[(CH3)2N]4Ti
CAS号:
3275-24-9
分子量:
224.17
EC 号:
221-904-3
MDL编号:
MFCD00014861
UNSPSC代码:
12352103
PubChem化学物质编号:
24870618
NACRES:
NA.23

质量水平

200

方案

99.999% trace metals basis

表单

liquid

反应适用性

core: titanium

沸点

50 °C/0.5 mmHg (lit.)

密度

0.947 g/mL at 25 °C (lit.)

SMILES字符串

CN(C)[Ti](N(C)C)(N(C)C)N(C)C

InChI

1S/4C2H6N.Ti/c4*1-3-2;/h4*1-2H3;/q4*-1;+4

InChI key

MNWRORMXBIWXCI-UHFFFAOYSA-N

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一般描述

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应用

Tetrakis（二甲基氨基）钛（IV）（TDMAT）是通过有机金属化学气相沉积（OMCVD）和通过原子层沉积（ALD）的二氧化钛薄膜的氮化钛（TiN）薄膜的前体。TDMAT 与过量的环戊二烯发生放热反应得到三（二甲基氨基）（η5-环戊二烯基）钛（IV）。

象形图

FlameCorrosion
GHS02,GHS05

警示用语：

Danger

危险声明

H225,H260,H314

危险分类

Flam. Liq. 2 - Skin Corr. 1B - Water-react 1

补充剂危害

EUH014

储存分类代码

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

闪点(°F)

-22.0 °F - closed cup

闪点(°C)

-30 °C - closed cup

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

法规信息

危险化学品

历史批次信息供参考:

分析证书(COA)

Lot/Batch Number
SHBS2053
SHBP1947
SHBL6315
SHBL2751
SHBH9716

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Young modulus and Poisson ratio measurements of TiO 2 thin films deposited with atomic layer deposition.
Borgese L, et al.
Surface and Coatings Technology, 206(8), 2459-2463 (2012)
Degao Wang et al.
Proceedings of the National Academy of Sciences of the United States of America, 115(34), 8523-8528 (2018-08-08)
Stabilized photoanodes for light-driven water oxidation have been prepared on nanoparticle core/shell electrodes with surface-stabilized donor-acceptor chromophores, a water oxidation catalyst, and an electron-transfer mediator. For the electrode, fluorine-doped tin oxide FTO|SnO2/TiO2|-Org1-|1.1 nm Al2O3|-RuP2+-WOC (water oxidation catalyst) with Org1 (1-cyano-2-(4-(diphenylamino)phenyl)vinyl)phosphonic
Tianshuo Zhao et al.
Proceedings of the National Academy of Sciences of the United States of America, 118(7) (2021-02-10)
Semiconductors of narrow bandgaps and high quantum efficiency have not been broadly utilized for photocatalytic coevolution of H2 and O2 via water splitting. One prominent issue is to develop effective protection strategies, which not only mitigate photocorrosion in an aqueous
Microstructure and elastic properties of atomic layer deposited TiO 2 anatase thin films.
Borgese L, et al.
Acta Materialia, 59(7), 2891-2900 (2011)
Chemistry of Materials, 8, 2712-2712 (1996)
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