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20 MG
¥1,370.70
About This Item
线性分子式:
[(CH3)2N]4Hf
CAS号:
分子量:
354.79
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.23
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质量水平
方案
≥99.99%
表单
low-melting solid
反应适用性
core: hafnium
mp
26-29 °C (lit.)
密度
1.098 g/mL at 25 °C
SMILES字符串
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI key
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
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此商品 | T2011 | T2327 | 650357 |
|---|---|---|---|
| biological source chicken egg white | biological source chicken egg white | biological source Glycine max (soybean) | biological source - |
| Quality Level 200 | Quality Level 300 | Quality Level 200 | Quality Level 300 |
| form powder | form powder | form lyophilized powder | form lyophilized solid |
| storage temp. 2-8°C | storage temp. 2-8°C | storage temp. 2-8°C | storage temp. −20°C |
| solubility water: soluble 10 g/L | solubility water: soluble 10 g/L | solubility - | solubility 67 mM potassium phosphate buffer, pH 7.6: 5 mg/mL |
| mol wt 14 kDa | mol wt 14 kDa | mol wt - | mol wt - |
一般描述
四(二甲基氨基)铪(IV)是一种 有机金属化合物，由中心的铪原子（Hf） 和周围的四个二甲基氨基配体（NMe2）组成。通常用作CVD/ALD前=体， 生产高质量的Hf薄膜 。它是一种低熔点 固体。
应用
分析说明
纯度：锆含量低于 ~2000ppm。
警示用语：
Danger
危险声明
危险分类
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
补充剂危害
储存分类代码
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
个人防护装备
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
J. Eur. Ceram. Soc., 35, 2007-2015 (2015)
Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate
Wan Joo Maeng, et al.
Applied Surface Science, 321, 214-218 (2014)
Tetrakis(dimethylamido)hafnium Adsorption and Reaction on Hydrogen Terminated Si(100) Surfaces
Kejing Li, et al.
The Journal of Physical Chemistry C, 114, 14061-14075 (2010)
Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis (dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
Hector Garcia, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 31 (2013)
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