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蒸汽密度
>1 (vs air)
质量水平
检测方案
≥98%
形式
liquid
折射率
n20/D 1.377 (lit.)
bp
101 °C (lit.)
101 °C
mp
−59 °C (lit.)
密度
0.764 g/mL at 20 °C (lit.)
SMILES字符串
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
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一般描述
六甲基二硅氧烷（HMDSO）是一种线性聚二硅氧烷 ，这种有机硅试剂通常被用作通过等离子体增强化学气相沉积（PE-CVD）技术制备硅化合物薄膜的源气体。在硅集成电路技术中，它还用作硅烷的替代品。已采用傅里叶变换质谱对其通过电子轰击产生的离解电离进行了研究。通过大气压辉光（APG）放电合成等离子体聚合的HMDSO薄膜已被报道。在148K的HMDSO晶体是单斜晶体。在P4S10中添加HMDSO可提高其作为硫化剂的效率。
应用
六甲基二硅氧烷可用于：
- 通过干法沉积工艺来制造具有受控疏水性有机硅纳米层的气体扩散层（GDL）。
- 分别使用精氨酸和葡萄糖作为催化剂和还原剂制备涂有二氧化硅的银纳米颗粒。
警示用语：
Danger
危险声明
预防措施声明
危险分类
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
WGK
WGK 2
闪点(°F)
closed cup
闪点(°C)
closed cup
个人防护装备
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
法规信息
危险化学品
Israel Sifuentes-Nieves et al.
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in
Tae-Jun Ko et al.
ACS applied materials & interfaces, 7(9), 5506-5513 (2015-02-18)
Reliable operation of a proton exchange membrane fuel cell requires proper water management to prevent water flooding in porous carbon materials such as the gas diffusion layer (GDL). In contrast to the conventional GDL that uses the "wet" dip-coating process
Philippe Saint-Cricq et al.
Journal of materials chemistry. B, 1(19), 2451-2454 (2013-05-21)
Mesoporous silica-coated silver nanoparticles (Ag@MSN) were prepared by a two step synthesis in an environment friendly way. Arginine and glucose were used as a catalyst for the formation of silica and as a reducing agent for silver ions, respectively, in
Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Schmidt-Szalowski K, et al.
Plasmas and polymers, 5(3-4), 173-190 (2000)
The crystal and molecular structures of disiloxane (at 108 K) and hexamethyldisiloxane (at 148 K).
Barrow MJ, et al.
Acta Crystallographica Section B, Structural Science, Crystal Engineering and Materials, 35(9), 2093-2099 (1979)
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