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蒸汽密度
>1 (vs air)
质量水平
蒸汽压
<0.01 mmHg ( 21 °C)
方案
≥95% (NT)
表单
solid
颜色
colorless to light yellow
折射率
n20/D 1.516 (lit.)
n20/D 1.517
沸点
130-135 °C/1 mmHg (lit.)
密度
0.969 g/mL at 25 °C (lit.)
应用
hematology
histology
储存温度
2-8°C
SMILES字符串
CN(C)Cc1cc(CN(C)C)c(O)c(CN(C)C)c1
InChI
1S/C15H27N3O/c1-16(2)9-12-7-13(10-17(3)4)15(19)14(8-12)11-18(5)6/h7-8,19H,9-11H2,1-6H3
InChI key
AHDSRXYHVZECER-UHFFFAOYSA-N
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应用
Epoxy embedding medium, accelerator is used according to the protocol provided for Epoxy Embedding Medium kit, Prod. No. 45359 available on-line. The embedding media is used for electron microscopy.
法律信息
Epon is a trademark of Hexion, Inc.
警示用语：
Danger
危险声明
危险分类
Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1B
储存分类代码
8A - Combustible corrosive hazardous materials
WGK
WGK 1
闪点(°F)
300.2 °F - closed cup
闪点(°C)
149 °C - closed cup
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Masashi Yamaguchi et al.
Journal of electron microscopy, 58(4), 261-266 (2009-03-18)
A smart and efficient method for freeze substitution and serial sectioning of yeast cells is described. Yeast cells were placed in a single layer between two copper disks, rapidly frozen, freeze substituted and embedded in an epoxy resin. The cell
S H Brorson
Micron (Oxford, England : 1993), 29(2-3), 89-95 (1998-07-31)
The purpose of this study was to examine how antigen retrieval affected the yield of immunogold labeling on epoxy sections based on embedding with different amounts of accelerator. The concentration of accelerator DMP-30 (tri(dimethyl amino methyl) phenol) was varied in
A Schaper et al.
FEBS letters, 355(1), 91-95 (1994-11-21)
We present recent advances in DNA specimen preparation technique for scanning force microscopy (SFM) based on spreading on mica in the presence of cationic and non-ionic detergents. Reproducible DNA imaging in air and in n-propanol has been achieved in the
L Kanerva et al.
International journal of dermatology, 35(12), 852-856 (1996-12-01)
Epoxy resin compounds (ERC) include a large number of sensitizing chemicals such as epoxy resins (ER), hardeners (curing agents), and reactive diluents. Allergic contact dermatitis (ACD) caused by ERCS is often occupational. We report a patient, sensitized to a hardener
Julien Le Roux et al.
Environmental science & technology, 46(3), 1581-1589 (2012-01-05)
The formation of NDMA and other DBPs (including THMs, HANs, and HKs) has been investigated by chloramination of several tertiary amines in the absence and presence of bromide ion. NDMA formation from the most reactive tertiary amines (e.g., dimethylaminomethylfurfuryl alcohol
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