所有图片(1)
About This Item
经验公式（希尔记法）:
C10H10ClNO4
分子量:
243.64
Beilstein:
7642748
MDL编号:
UNSPSC代码:
12352200
PubChem化学物质编号:
NACRES:
NA.03
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方案
~95% chlorine basis
储存温度
−20°C
SMILES字符串
CC(COC(Cl)=O)c1ccccc1[N+]([O-])=O
InChI
1S/C10H10ClNO4/c1-7(6-16-10(11)13)8-4-2-3-5-9(8)12(14)15/h2-5,7H,6H2,1H3
InChI key
LRWLGGPRIFYAPO-UHFFFAOYSA-N
其他说明
引入光敏 NPPOC 保护基团的试剂
警示用语：
Danger
危险分类
Acute Tox. 3 Oral - Skin Corr. 1B
储存分类代码
6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
WGK
WGK 3
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
W. Pfleiderer et al.
Tetrahedron Letters, 53, 4247-4247 (1997)
M Beier et al.
Nucleic acids research, 28(4), E11-E11 (2000-01-29)
For DNA chip analyses, oligonucleotide quality has immense consequences for accuracy, sensitivity and dynamic range. The quality of chips produced by photolithographic in situ synthesis depends critically on the efficiency of photo-deprotection. By means of base-assisted enhancement of this process
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