Boron implant in silicon standard for calibration of concentration in a depth profile

This Standard Reference Material (SRM) is intended for use in calibrating the secondary ion response to minor and trace levels of boron in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). A unit of SRM 2137 consists of a single crystal silicon substrate with a surface rendered disordered by silicon ion implantation. For more information, please refer to the SDS and COA.

SRM 2137_cert

SRM 2137_SDS

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Boron (¹⁰B)

See certificate for values and more details at nist.gov/SRM.

NIST is a registered trademark of National Institute of Standards and Technology

SRM is a registered trademark of National Institute of Standards and Technology