Phosphorus implant in silicon depth profile standard

This Standard Reference Material (SRM) is intended for use in calibrating secondary ion response to minor and trace levels of phosphorus in a silicon matrix by the analytical technique of secondary ion mass spectrometry (SIMS). SRM 2133 is intended for calibrating the response of a SIMS instrument for phosphorus in a silicon matrix under a specific set of instrumental conditions. It may also be used by a laboratory as a transfer standard for the calibration of working standards of phosphorus in silicon. This SRM consists of a 1 cm × 1 cm single crystal silicon substrate that has been ion-implanted with the isotope 31P at a nominal energy of 100 keV. For more information, please refer to the COA and SDS.

SRM 2133_cert

SRM 2133_SDS

Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Phosphorus (³¹P)

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SRM is a registered trademark of National Institute of Standards and Technology