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Merck
CN

316989

Sigma-Aldrich

过氧化氢 溶液

contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis

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About This Item

经验公式(希尔记法):
H2O2
CAS号:
分子量:
34.01
Beilstein:
3587191
MDL编号:
UNSPSC代码:
12352300
PubChem化学物质编号:

蒸汽密度

1 (vs air)

质量水平

蒸汽压

23.3 mmHg ( 30 °C)

方案

99.999% trace metals basis

表单

liquid

包含

potassium stannate as inhibitor
stabilizer

反应适用性

reagent type: oxidant

浓度

30-32 wt. % in water, semiconductor grade

密度

1.11 g/mL at 25 °C

储存温度

2-8°C

SMILES字符串

OO

InChI

1S/H2O2/c1-2/h1-2H

InChI key

MHAJPDPJQMAIIY-UHFFFAOYSA-N

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相关类别

一般描述

Hydrogen peroxide solution is a widely used oxidizing agent in a variety of applications, including the oxidation of cyanide in industrial waste samples, the removal of ammonia from semiconductor wastewater, the removal of ibuprofen from water and wastewater, and the treatment of wastewater containing five-membered heterocyclic pyrazoles. It is one of the most widely used wet electronic chemicals.

应用

Hydrogen peroxide solution can be used in the substrate preparation for ultrathin polymer films.

象形图

Corrosion

警示用语:

Danger

危险声明

危险分类

Aquatic Chronic 3 - Eye Dam. 1

储存分类代码

5.1B - Oxidizing hazardous materials

WGK

WGK 1

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

法规信息

新产品

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分析证书(COA)

Lot/Batch Number

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访问文档库

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Photochemical reduction of gold (III) on semiconductor dispersions of TiO2 in the presence of CN- ions: disposal of CN- by treatment with hydrogen peroxide
Serpone N, et al.
Journal of Photochemistry, 36, 373-388 (1987)
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