09649
5-苯甲酰基-4-羟基-2-甲氧基苯
≥97.0% (HPLC)
别名:
HMBS, 舒利苯酮
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关于此项目
经验公式（希尔记法）:
C14H12O6S
化学文摘社编号:
分子量:
308.31
UNSPSC Code:
12352100
NACRES:
NA.22
PubChem Substance ID:
EC Number:
223-772-2
Beilstein/REAXYS Number:
2889165
MDL number:
Assay:
≥97.0% (HPLC)
Form:
powder
InChI key
CXVGEDCSTKKODG-UHFFFAOYSA-N
InChI
1S/C14H12O6S/c1-20-12-8-11(15)10(7-13(12)21(17,18)19)14(16)9-5-3-2-4-6-9/h2-8,15H,1H3,(H,17,18,19)
SMILES string
COc1cc(O)c(cc1S(O)(=O)=O)C(=O)c2ccccc2
assay
≥97.0% (HPLC)
form
powder
impurities
≤10% water
functional group
ketone, phenyl, sulfonic acid
signalword
Warning
hcodes
Hazard Classifications
Aquatic Chronic 3 - Eye Irrit. 2 - Skin Irrit. 2
存储类别
11 - Combustible Solids
wgk
WGK 1
flash_point_f
No data available
flash_point_c
No data available
ppe
dust mask type N95 (US), Eyeshields, Gloves
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The stability of the UV filter benzophenone-4 (BP-4) in free chlorine-containing water was investigated, for the first time, by liquid chromatography quadrupole time-of-flight mass spectrometry (LC-QqTOF-MS). High mass accuracy and resolution capabilities of this hybrid mass spectrometer were used for
T Merion Hughes et al.
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Chemical ultraviolet (UV) filters have, over the last few decades, been increasingly used not only in conventional sunscreen products but also in many cosmetics and toiletries. Allergic contact dermatitis as well as photoallergic contact dermatitis reactions have been well documented
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Exposure to ethylene glycol monomethyl ether (EGME), a glycol ether compound found in numerous industrial products, or to its active metabolite, 2-methoxyacetic acid (2-MAA), increases the incidence of developmental defects. Using an in vitro limb bud culture system, we tested
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2-Hydroxy-4-methoxybenzophenone and 2-hydroxy-4-methoxybenzophenone-5-sulphonic acid, commonly known as benzophenone-3 (BZ3) and benzophenone-4 (BZ4), respectively, are substances widely used as UV filters in cosmetic products in order to absorb UV radiation and protect human skin from direct exposure to the deleterious wavelengths
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