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蒸汽压
1 mmHg ( 487 °C)
方案
99.995% trace metals basis
表单
solid
电阻率
5.8 μΩ-cm, 20°C
直径× 厚度
3.00 in. × 0.125 in.
沸点
907 °C (lit.)
mp
420 °C (lit.)
密度
7.133 g/mL at 25 °C (lit.)
SMILES字符串
[Zn]
InChI
1S/Zn
InChI key
HCHKCACWOHOZIP-UHFFFAOYSA-N
应用
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
储存分类代码
11 - Combustible Solids
WGK
WGK 3
法规信息
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