检测方案
99.95% trace metals basis
形式
solid
反应适用性
core: chromium
电阻率
12.7 μΩ-cm, 20°C
直径× 厚度
3.00 in. × 0.125 in.
bp
2672 °C (lit.)
mp
1857 °C (lit.)
密度
7.14 g/mL at 25 °C (lit.)
SMILES字符串
[Cr]
InChI
1S/Cr
InChI key
VYZAMTAEIAYCRO-UHFFFAOYSA-N
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应用
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.
WGK
nwg
闪点(°F)
Not applicable
闪点(°C)
Not applicable
法规信息
新产品
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Journal of exposure analysis and environmental epidemiology, 10(2), 103-114 (2000-05-03)
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