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Merck
CN

749052

Sigma-Aldrich

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.95% trace metals basis

别名:

Chromium element

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About This Item

经验公式(希尔记法):
Cr
CAS号:
分子量:
52.00
EC 号:
MDL编号:
UNSPSC代码:
12352103
PubChem化学物质编号:
NACRES:
NA.23

检测方案

99.95% trace metals basis

形式

solid

反应适用性

core: chromium

电阻率

12.7 μΩ-cm, 20°C

直径× 厚度

3.00 in. × 0.125 in.

bp

2672 °C (lit.)

mp

1857 °C (lit.)

密度

7.14 g/mL at 25 °C (lit.)

SMILES字符串

[Cr]

InChI

1S/Cr

InChI key

VYZAMTAEIAYCRO-UHFFFAOYSA-N

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应用

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

WGK

nwg

闪点(°F)

Not applicable

闪点(°C)

Not applicable

法规信息

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