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Merck
CN
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主要文件

667528

Sigma-Aldrich

铜蚀刻剂

别名:

铜蚀刻液

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About This Item

MDL编号:
UNSPSC代码:
12352300
NACRES:
NA.23

应用

它是铜喷涂蚀刻的理想选择。氯化铁基铜蚀刻剂,在40°C下的蚀刻速率为0.5 mil/min。
通过将具有纳米材料的基板浸入蚀刻剂溶液中30分钟,CE-200溶液可用于从化学气相沉积(CVD)石墨烯或碳酸膜中蚀刻出铜残留物或箔。

象形图

Corrosion

警示用语:

Danger

危险声明

危险分类

Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1

储存分类代码

8B - Non-combustible corrosive hazardous materials

WGK

WGK 1

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter


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分析证书(COA)

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Microbial colonisation of transparent glass-like carbon films triggered by a reversible radiation-induced hydrophobic to hydrophilic transition
Jalvo B, et al.
Royal Society of Chemistry Advances, 6(55), 50278-50287 (2016)
Stretchable and Hydrophobic Electrochromic Devices Using Wrinkled Graphene and PEDOT: PSS
Nemani SK, et al.
Journal of Nanomaterials, 2018(1-3), 63-68 (2018)
Fangyuan Zheng et al.
ACS nano, 14(2), 2137-2144 (2020-01-18)
The emergent two-dimensional (2D) materials are atomically thin and ultraflexible, promising for a variety of miniaturized, high-performance, and flexible devices in applications. On one hand, the ultrahigh flexibility causes problems: the prevalent wrinkles in 2D materials may undermine the ideal
Controlled synthesis of nanocrystalline glass-like carbon thin films with tuneable electrical and optical properties
Romero P, et al.
Chemical Engineering Journal, 299(1-3), 8-14 (2016)
Copper etching with cupric chloride and regeneration of waste etchant
Cakir O
Journal of Materials Processing Technology, 175(1-3), 63-68 (2006)

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