所有图片(1)
别名:
3-(3,5,7,9,11,13,15-七异丁基五环[9.5.13,9.15,15.17,13]八硅氧烷-1-基)丙基甲基丙烯酸酯
经验公式（希尔记法）:
C35H74O14Si8
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![PSS-[3-(2-氨乙基)氨基]丙基-取代七异丁基](/deepweb/assets/sigmaaldrich/product/structures/583/905/1ee2f0b3-2da3-49d4-af68-a0382b34aeff/640/1ee2f0b3-2da3-49d4-af68-a0382b34aeff.png)
mp
108-112 °C (lit.)
质量水平
SMILES字符串
CC(C)C[Si]12O[Si]3(CCCOC(=O)C(C)=C)O[Si]4(CC(C)C)O[Si](CC(C)C)(O1)O[Si]5(CC(C)C)O[Si](CC(C)C)(O2)O[Si](CC(C)C)(O3)O[Si](CC(C)C)(O4)O5
InChI
1S/C35H74O14Si8/c1-27(2)20-51-38-50(19-17-18-37-35(36)34(15)16)39-52(21-28(3)4)43-54(41-51,23-30(7)8)47-57(26-33(13)14)48-55(42-51,24-31(9)10)44-53(40-50,22-29(5)6)46-56(45-52,49-57)25-32(11)12/h27-33H,15,17-26H2,1-14,16H3
InChI key
CVYLJMBNVJQTGW-UHFFFAOYSA-N
相关类别
一般描述
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted silsesquioxane (POSS) is a polyhedral oligomeric silsesquioxane (POSS) with an inorganic-organic cage-like architecture made up of silicon and oxygen.
应用
PSS-(1-Propylmethacrylate)-Heptaisobutyl substituted can be used as a functional monomer to prepare molecularly imprinted polymers or hybrid monolithic materials (MIPs) via reversible addition-fragmentation chain transfer polymerization (RAFT) or thermally initiated free radical polymerization reactions using suitable template molecules, cross-linker, porogenic solvent, and initiator. The resulting polymeric materials exhibited excellent polymer properties such as high thermal stability, high mechanical stability, low inflammability surface hardening, and oxidation resistance. These POSS nanostructural polymeric materials are commonly used in various biomedical applications, drug delivery, imaging reagents, catalyst supports, enzyme-like catalysis, solid-phase extraction, sensors, and in the chromatographic stationary phase.
WGK
WGK 3
个人防护装备
Eyeshields, Gloves, type N95 (US)
Qing-Li Zhao et al.
Talanta, 152, 277-282 (2016-03-20)
Polyhedral oligomeric silsesquioxane (POSS) was successfully applied, for the first time, to prepare imprinted monolithic coating for capillary electrochromatography. The imprinted monolithic coating was synthesized with a mixture of PSS-(1-Propylmethacrylate)-heptaisobutyl substituted (MA 0702), S-amlodipine (template), methacrylic acid (functional monomer), and
Shu-Ping Gao et al.
Analytical and bioanalytical chemistry, 409(15), 3741-3748 (2017-03-28)
Polyhedral oligomeric silsesquioxane (POSS) was utilized to prepare imprinted polymer through reversible addition-fragmentation chain transfer polymerization (RAFT) successfully. The imprinted polymer was made with a mixture of RAFT agent, 4-vinylpyridine (4-VP), POSS monomer [PSS-(1-propylmethacrylate)-heptaisobutyl substituted, MA 0702], and ethylene glycol
Junjie Ou et al.
Analytica chimica acta, 761, 209-216 (2013-01-15)
A simple approach to fabricate hybrid monolithic column within the confines of fused-silica capillaries (75 μm i.d.) was introduced. A polyhedral oligomeric silsesquioxanes (POSS) reagent containing a methacrylate group was selected as functional monomer, and copolymerized with bisphenol A dimethacrylate
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