所有图片(1)
About This Item
经验公式（希尔记法）:
H2O2
CAS号:
分子量:
34.01
Beilstein:
3587191
MDL编号:
UNSPSC代码:
12352304
PubChem化学物质编号:
推荐产品
等级
semiconductor grade VLSI PURANAL™ (Honeywell 17606)
蒸汽压
23.3 mmHg ( 30 °C)
方案
≥30%
CofA
specification on request
保质期
~2 yr
反应适用性
reagent type: oxidant
浓度
25-35%
密度
1.110 g/cm3
储存温度
2-8°C
SMILES字符串
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI key
MHAJPDPJQMAIIY-UHFFFAOYSA-N
正在寻找类似产品? 访问 产品对比指南
一般描述
Hydrogen peroxide is a strong oxidizer. It may be produced industrially by anthraquinone oxidation. it is used in semiconductor industry essentially for cleaning silicon wafers, removal of photoresists and to etch metallic copper on printed circuit boards. Ultrapurification of hydrogen peroxide by reverse osmosis has been reported in detail.
应用
Semiconductor grade hydrogen peroxide was used to etch TiN 2 and GaAs structures.
法律信息
PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH
警示用语：
Danger
危险声明
危险分类
Aquatic Chronic 3 - Eye Dam. 1
储存分类代码
5.1B - Oxidizing hazardous materials
WGK
WGK 1
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
法规信息
新产品
TiN metal hardmask etch residue removal on advanced porous low-k and Cu device with corner rounding scheme
Cui H, et al.
Solid State Phenomena, 187 (2012)
Ultrapurification of hydrogen peroxide solution from ionic metals impurities to semiconductor grade by reverse osmosis.
Abejon R, et al.
Separation and Purification Technology, 76(1), 44-51 (2010)
Localized GaAs etching with acidic hydrogen peroxide solutions
Shaw DW, et al.
Journal of the Electrochemical Society, 128(4), 874-880 (1981)
Jose M Campos-Martin et al.
Angewandte Chemie (International ed. in English), 45(42), 6962-6984 (2006-10-14)
Hydrogen peroxide (H2O2) is widely used in almost all industrial areas, particularly in the chemical industry and environmental protection. The only degradation product of its use is water, and thus it has played a large role in environmentally friendly methods
Shoichi Iriguchi et al.
Blood, 125(2), 370-382 (2014-10-29)
Although overexpression of T-bet, a master transcription factor in type-1 helper T lymphocytes, has been reported in several hematologic and immune diseases, its role in their pathogenesis is not fully understood. In the present study, we used transgenic model mice
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系技术服务部门