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等级
semiconductor grade PURANAL™ (Honeywell 17824)
蒸汽密度
1.11 (vs air)
蒸汽压
410 mmHg ( 50 °C)
97.68 mmHg ( 20 °C)
形式
liquid
CofA
specification on request
自燃温度
725 °F
expl. lim.
36 %
折射率
n20/D 1.329 (lit.)
bp
64.7 °C (lit.)
mp
−98 °C (lit.)
密度
0.791 g/mL at 25 °C (lit.)
格式
neat
SMILES字符串
CO
InChI
1S/CH4O/c1-2/h2H,1H3
InChI key
OKKJLVBELUTLKV-UHFFFAOYSA-N
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应用
Semiconductor grade methanol may be used to degas indium antimonide wafers. Poly(amidoamine) (PAMAM) was coupled with carboxylic acid terminated Si surfaces by soaking the Si surfaces in methanol. Methanol may be used to degrease silicon ingots and ribbons. It may be used in the purification of surfactant (sodium diethylhexylsulfosuccinate) and to prepare a colloidal suspension of silicon.
法律信息
PURANAL is a trademark of Honeywell Specialty Chemicals Seelze GmbH
警示用语：
Danger
危险分类
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Flam. Liq. 2 - STOT SE 1
靶器官
Eyes
WGK
WGK 2
个人防护装备
Eyeshields, Faceshields, Gloves
法规信息
危险化学品
LA-ICP-MS, IC and DPASV-DPCSV determination of metallic impurities in solar-grade silicon.
Buldini PL, et al.
Talanta, 47(1), 203-212 (1998)
Luminescent colloidal silicon suspensions from porous silicon.
Heinrich JL, et al.
Science, 255, 66-68 (1992)
Investigation of the mobility of amphiphilic polymer?AOT reverse microemulsion systems using electron spin resonance
Wines TH, et al.
Journal of Colloid and Interface Science, 285(1), 318-325 (2005)
Immobilization of dendrimers on Si?C linked carboxylic acid-terminated monolayers on silicon (111).
Bocking T, et al.
Thin Solid Films, 515(4), 1857-1863 (2006)
Growth and characterization of indium antimonide and gallium antimonide crystals.
Udayashankar NK and Bhat HL
Bulletin of Materials Science, 24(5), 445-453 (2001)
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