342890
二氧化硅
−325 mesh, 99.5% trace metals basis
别名:
方石英, 石英, 砂石, 硅石
登录 查看组织和合同定价。
选择尺寸
关于此项目
线性分子式:
SiO2
化学文摘社编号:
分子量:
60.08
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352303
EC Number:
262-373-8
MDL number:
产品名称
二氧化硅, −325 mesh, 99.5% trace metals basis
InChI key
VYPSYNLAJGMNEJ-UHFFFAOYSA-N
InChI
1S/O2Si/c1-3-2
SMILES string
O=[Si]=O
assay
99.5% trace metals basis
form
powder
refractive index
n20/D 1.544 (lit.)
particle size
−325 mesh
mp
1610 °C (lit.)
density
2.6 g/mL at 25 °C (lit.)
application(s)
battery manufacturing
Quality Level
正在寻找类似产品? 访问 产品对比指南
Application
SiO2主要用作具有良好热机械性质的基质材料，可用于各种应用，包括：气相沉积、相沉积、原子力显微镜探针(AFM)、旋转涂覆、电子设备。
Other Notes
其可能含有吸附的H2O和CO2，这些组分可通过在>900°C下煅烧除去
存储类别
13 - Non Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
dust mask type N95 (US), Eyeshields, Gloves
Measurement of the adhesion force between carbon nanotubes and a silicon dioxide substrate.
Whittaker JD, et al.
Nano Letters, 6(5), 953-957 (2006)
Oxygen-aided synthesis of polycrystalline graphene on silicon dioxide substrates.
Chen J, et al.
Journal of the American Chemical Society, 133(44), 17548-17551 (2011)
Growth model of bamboo-shaped carbon nanotubes by thermal chemical vapor deposition.
Lee CJ and Park J
Applied Physics Letters, 77(21), 3397-3399 (2000)
The effect of calcination temperature on the surface microstructure and photocatalytic activity of TiO2 thin films prepared by liquid phase deposition.
Yu J, et al.
The Journal of Physical Chemistry B, 107(50), 13871-13879 (2003)
Exciton diffusion measurements in poly (3-hexylthiophene).
Shaw PE, et al.
Advanced Materials, 20(18), 3516-3520 (2008)
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系客户支持