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蒸汽密度
3.5 (vs air)
蒸汽压
1254 mmHg ( 20 °C)
描述
film resistivity > 50 Ω-cm
方案
≥99.99% trace metals basis
自燃温度
136 °F
expl. lim.
99 %
沸点
8.3 °C (lit.)
mp
−122 °C (lit.)
SMILES字符串
Cl[SiH2]Cl
InChI
1S/Cl2H2Si/c1-3-2/h3H2
InChI key
MROCJMGDEKINLD-UHFFFAOYSA-N
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一般描述
Dichlorosilane (DCS) is a halogenated silicon based precursor that facilitates the growth of a variety of silane based films such as silicon oxide, silicon nitride, silicon carbide, and epitaxial growth of silica.
应用
DCS is widely used in the synthesis of a variety of silicon-based materials, which find applications in the development of organic electronics based devices, including OFETs, MEMS, NEMS, MOSFETS, and lithium-ion batteries.
警示用语:
Danger
危险分类
Acute Tox. 2 Inhalation - Eye Dam. 1 - Flam. Gas 1 - Press. Gas Liquefied gas - Skin Corr. 1B
补充剂危害
储存分类代码
2A - Gases
WGK
WGK 1
闪点(°F)
-34.6 °F
闪点(°C)
-37 °C
个人防护装备
Faceshields, Gloves, Goggles, multi-purpose combination respirator cartridge (US)
法规信息
新产品
Electrophoresis, 20(12), 2412-2419 (1999-09-28)
The feasibility of polymeric phases based on a silicone polymer backbone as pseudostationary phases for electrokinetic chromatography has been investigated. Silicone phases were studied because of the range of chemistries that could be developed based on these backbones, and because
Journal of biomolecular structure & dynamics, 22(3), 331-337 (2004-10-12)
This report shows a new DNA stretching method using migration of an ice-water interface. DNA molecules were stretched accompanying the migration of the solid-liquid interface and immobilized in frozen area. This simple method needs no chemical modification to keep DNA
Low pressure chemical vapor deposition of silicon carbide from dichlorosilane and acetylene.
Materials Chemistry and Physics, 63(3), 196-201 (2000)
Stress control of polycrystalline 3C−SiC films in a large-scale LPCVD reactor using 1, 3-disilabutane and dichlorosilane as precursors.
Journal of Micromechanics and Microengineering, 16(12), 2736-2736 (2006)
Journal of agricultural and food chemistry, 53(9), 3618-3625 (2005-04-28)
The structure and rheological properties of xanthan gum (XG) modified in a cold plasma environment were investigated. XG was functionalized in a capacitively coupled 13.56-MHz radio frequency dichlorosilane (DS)-plasma conditions and, consecutively, in situ aminated by ethylenediamine. The surface structure
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