推荐产品
质量水平
方案
95%
mp
168-175 °C (lit.)
官能团
nitrile
SMILES字符串
N#Cc1nc[nH]c1C#N
InChI
1S/C5H2N4/c6-1-4-5(2-7)9-3-8-4/h3H,(H,8,9)
InChI key
XGDRLCRGKUCBQL-UHFFFAOYSA-N
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Danger
危险声明
危险分类
Eye Dam. 1 - Skin Irrit. 2 - STOT SE 3
靶器官
Respiratory system
储存分类代码
11 - Combustible Solids
WGK
WGK 3
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
dust mask type N95 (US), Eyeshields, Gloves
Matthew T Holden et al.
Analytical chemistry, 87(22), 11420-11428 (2015-10-24)
The photolithographic fabrication of high-density DNA and RNA arrays on flexible and transparent plastic substrates is reported. The substrates are thin sheets of poly(ethylene terephthalate) (PET) coated with cross-linked polymer multilayers that present hydroxyl groups suitable for conventional phosphoramidite-based nucleic
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