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Merck
CN

317004

Sigma-Aldrich

氟化钽(V)

98%

别名:

Tantalum pentafluoride

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About This Item

线性分子式:
TaF5
CAS号:
分子量:
275.94
EC 号:
MDL编号:
UNSPSC代码:
12352302
PubChem化学物质编号:
NACRES:
NA.23
方案:
98%
表单:
powder

质量水平

方案

98%

表单

powder

反应适用性

reagent type: catalyst
core: tantalum

密度

4.74 g/mL at 25 °C (lit.)

SMILES字符串

F[Ta](F)(F)(F)F

InChI

1S/5FH.Ta/h5*1H;/q;;;;;+5/p-5

InChI key

YRGLXIVYESZPLQ-UHFFFAOYSA-I

一般描述

Tantalum(V) fluoride is a volatile inorganiccompound widely used as a precursor for atomic layer deposition, to producemetal fluoride thin films and as a catalyst in various organic transformations.

应用

Tantalum(V) fluoride can be used:
  • As a precursor for atomic layer deposition of thin films on the cathode materials of Li-ion batteries.
  • As a dopant to enhance the photochemical activity of hematite by improving charge carrier mobility and reducing recombination of photogenerated holes and electrons.
  • To enhance the photocurrent stability and photoluminescence of WO3 films (used as photoelectrode for photolysis of water).
  • As a catalyst for N-alkylation of arylamines with benzylalcohols.

象形图

Corrosion

警示用语:

Danger

危险声明

危险分类

Eye Dam. 1 - Skin Corr. 1B

储存分类代码

8B - Non-combustible corrosive hazardous materials

WGK

WGK 3

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges


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分析证书(COA)

Lot/Batch Number

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访问文档库

Improvement of Hematite as Photocatalyst by Doping with Tantalum
Xinsheng Zhang, et al.
The Journal of Physical Chemistry C, 118, 16842-16850 (2014)
Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
A Enesca, et al.
Physica Status Solidi (A): Applied Research, 205, 2038-2041 (2008)
Applications and Advantages of Atomic Layer Deposition for Lithium-Ion Batteries Cathodes
Yury Koshtyal, et al.},
Lithium-Ion Batteries, 8, 184-184 (2022)

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