质量水平
检测方案
≥97%
形式
solid
mp
59-61 °C (lit.)
SMILES字符串
Cc1cc(N)no1
InChI
1S/C4H6N2O/c1-3-2-4(5)6-7-3/h2H,1H3,(H2,5,6)
InChI key
FKPXGNGUVSHWQQ-UHFFFAOYSA-N
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一般描述
3-氨基-5-甲基异恶唑是 嗜冷假单胞菌 菌株 HA-4 在磺胺甲恶唑生物降解过程中形成的主要中间体。它是磺胺甲恶唑 (SMX) 光催化降解过程中形成的中间体 。
应用
3-氨基-5-甲基异恶唑用于合成:
- 萘并[1,2-e][1,3]恶嗪
- 1-芳基-4-甲基-3,6- 双 -(5-甲基异恶唑-3-基)-2-硫代-2,3,6,10 b -四氢-1 H -嘧啶并[5,4- c ] ] 喹啉-5-酮系列,具有潜在的杀蚊杀幼活性
- 磺胺嘧啶和硫胺甲恶唑的羟胺
WGK
WGK 3
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Eyeshields, Gloves, type N95 (US)
The Science of the total environment, 633, 1217-1226 (2018-05-16)
Sulfamethoxazole (SMX) is a sulfonamide antibiotic, widely used as curative and preventive drug for human, animal, and aquaculture bacterial infections. Its residues have been ubiquitously detected in the surface waters and sediments. In the present study, SMX dissipation and kinetics
Molecular diversity, 16(4), 727-735 (2012-10-24)
An expeditious, straightforward and efficient synthesis of diversely naphtho[1,2-e][1,3]oxazines via one-pot condensation reaction of β- naphthol, 3-amino-5-methylisoxazole and arylaldehydes catalyzed by bismuth(III) trifluoromethanesulfonate is described. The reaction preferentially afforded 1,3-trans oxazines.
Environmental science and pollution research international, 24(7), 6195-6204 (2015-11-12)
The present study aims to assess the removal of 3-amino-5-methylisoxazole (AMI), a recalcitrant by-product resulting from the biological breakdown of some pharmaceuticals, applying a solar photo-Fenton process assisted by ferrioxalate complexes (SPFF) (Fe
Applied microbiology and biotechnology, 98(10), 4671-4681 (2014-02-14)
Sulfamethoxazole is a common antibiotic that is frequently detected in wastewater and surface water. This study investigated the biodegradation and metabolic pathway of sulfamethoxazole by Pseudomonas psychrophila HA-4, a cold-adapted bacterium. Strain HA-4, which uses sulfamethoxazole as its sole source
Journal of hazardous materials, 262, 812-818 (2013-10-22)
Photocatalytic degradation of sulfamethoxazole (SMX) was investigated using Bi2O3/Bi2O2CO3/Sr6Bi2O9 (BSO) photocatalyst under visible light (>420 nm) irradiation. The photochemical degradation of SMX followed pseudo-first-order kinetics. The reaction kinetics was determined as a function of initial SMX concentrations (5-20 mg L(-1))
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