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The current international situation is complex and volatile, and uncertain tariff policies may potentially impact our product prices. Given these uncertainties, we value your understanding regarding order-related matters.

If you decide to place an order during this period, we reserve the right to adjust the price based on the evolving situation. We understand that market changes may cause inconvenience. We will negotiate with you if there’s a significant price fluctuation due to tariff policy changes before the order’s actual delivery, and in such cases we may adjust or cancel the order as necessary.

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主要文件

229652

Sigma-Aldrich

氧氯化铪 水合物

99.99% trace metals basis (purity excludes zirconium)

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1 G
CN¥1,490.45

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1 G
CN¥1,490.45

About This Item

线性分子式:
HfOCl2 · xH2O
CAS号:
分子量:
265.40 (anhydrous basis)
EC 号:
MDL编号:
UNSPSC代码:
12352302
PubChem化学物质编号:
NACRES:
NA.23

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质量水平

方案

99.99% trace metals basis (purity excludes zirconium)

表单

crystalline

杂质

≤200.0 ppm Trace Metal Analysis

SMILES字符串

O.Cl[Hf](Cl)=O

InChI

1S/2ClH.Hf.H2O.O/h2*1H;;1H2;/q;;+2;;/p-2

InChI key

ONMNZQKEFYFCCQ-UHFFFAOYSA-L

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此商品
455962590592445541
assay

99.99% trace metals basis (purity excludes zirconium)

assay

99.9% trace metals basis

assay

99.9% trace metals basis

assay

99.99% trace metals basis (purity excludes ~2000 ppm zirconium.)

Quality Level

100

Quality Level

100

Quality Level

100

Quality Level

100

impurities

≤200.0 ppm Trace Metal Analysis

impurities

≤550.0 ppm Trace Metal Analysis

impurities

≤1500.0 ppm Trace Metal Analysis

impurities

-

一般描述

水合度 6-8

应用

HfGeO4 和 HfGeO4:Ti(都可用于 X 射线荧光粉)的原料。[1]

象形图

Corrosion

警示用语:

Danger

危险声明

危险分类

Skin Corr. 1B

储存分类代码

8B - Non-combustible corrosive hazardous materials

WGK

WGK 3

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges

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    分析证书(COA)

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    P. M. Lambert
    Inorganic chemistry, 37(6), 1352-1357 (2001-10-24)
    The gel chemistry of germanium is explored through the formation and composition of a hydrous metal oxide precursor gel used in the preparation of the HfGeO(4) and HfGeO(4):Ti X-ray phosphors. The enhanced solubility of hexagonal GeO(2) in dilute ammoniacal solutions

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