所有图片(4)
About This Item
线性分子式:
(CH3)3SiC≡CH
CAS号:
分子量:
98.22
Beilstein:
906752
MDL编号:
UNSPSC代码:
12352100
PubChem化学物质编号:
NACRES:
NA.22
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蒸汽压
4.18 psi ( 20 °C)
质量水平
方案
98%
表单
liquid
折射率
n20/D 1.388 (lit.)
沸点
53 °C (lit.)
密度
0.709 g/cm3 (lit.)
储存温度
2-8°C
SMILES字符串
C[Si](C)(C)C#C
InChI
1S/C5H10Si/c1-5-6(2,3)4/h1H,2-4H3
InChI key
CWMFRHBXRUITQE-UHFFFAOYSA-N
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一般描述
激光诱导气态乙炔三甲基硅烷基聚合反应被用来进行聚碳硅烷薄膜化学蒸发沉淀。乙炔三甲基硅烷基是镍催化苯腈类交联反应底物。
应用
乙炔三甲基硅烷基用于：
- 微波辅助一锅法三步Sonogashira交联-脱硅环加成反应，制备1,4-取代1,2，3-三唑
- 合成含有Pd（II）配位点的聚（乙炔三甲基硅烷基）
- 通过1,3-两极重氮化合物乙酰基环加成合成吡唑
警示用语：
Danger
危险声明
危险分类
Eye Irrit. 2 - Flam. Liq. 2 - Skin Irrit. 2
储存分类代码
3 - Flammable liquids
WGK
WGK 1
闪点(°F)
-29.2 °F
闪点(°C)
-34 °C
个人防护装备
Faceshields, Gloves, Goggles
法规信息
危险化学品
从最新的版本中选择一种：
分析证书(COA)
Lot/Batch Number
Frédéric Friscourt et al.
Organic letters, 12(21), 4936-4939 (2010-10-15)
A microwave-assisted, one-pot, three-step Sonogashira cross-coupling-desilylation-cycloaddition sequence was developed for the convenient preparation of 1,4-disubstituted 1,2,3-triazoles starting from a range of halides, acyl chlorides, ethynyltrimethylsilane, and azides.
Francisco J Caparrós et al.
Molecules (Basel, Switzerland), 25(4) (2020-02-26)
A new 2,7,10,15-tetraethynyldibenzo[g,p]chrysene ligand (1) and two tetranuclear gold(I) derivatives containing PPh3 (3) and PMe3 (4) phosphines were synthesized and characterized by 1H and 31P NMR, IR spectroscopy, and high-resolution mass spectrometry. The compounds were studied in order to analyze
Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane.
Pola J, et al.
Surface and Coating Tech., 149(2), 129-134 (2002)
Tetrahedron Letters, 45, 4989-4992 (2004)
Synthesis and characterization of poly (ethynyltrimethylsilane) containing Pd (II) coordination sites.
Russo MV, et al.
Polymer, 37(9), 1715-1722 (1996)
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