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About This Item
经验公式（希尔记法）:
HfO2
CAS号:
分子量:
210.49
EC 号:
MDL编号:
UNSPSC代码:
12352303
PubChem化学物质编号:
NACRES:
NA.23
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质量水平
方案
98%
表单
powder
密度
9.68 g/mL at 25 °C (lit.)
SMILES字符串
O=[Hf]=O
InChI
1S/Hf.2O
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
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应用
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
储存分类代码
11 - Combustible Solids
WGK
nwg
闪点(°F)
Not applicable
闪点(°C)
Not applicable
个人防护装备
Eyeshields, Gloves, type N95 (US)
商品
In recent years silicon carbide, SiC, has re-emerged as a vital technological material that is crucial in many materials and engineering applications.
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