202118
氧化铪(IV)
powder, 98%
别名:
Hafnia, Hafnium dioxide, Hafnium oxide
登录 查看组织和合同定价。
选择尺寸
关于此项目
经验公式（希尔记法）:
HfO2
化学文摘社编号:
分子量:
210.49
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352303
EC Number:
235-013-2
MDL number:
产品名称
氧化铪(IV), powder, 98%
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
InChI
1S/Hf.2O
SMILES string
O=[Hf]=O
assay
98%
form
powder
density
9.68 g/mL at 25 °C (lit.)
Quality Level
正在寻找类似产品? 访问 产品对比指南
Application
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
存储类别
11 - Combustible Solids
wgk
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type N95 (US)
商品
In recent years silicon carbide, SiC, has re-emerged as a vital technological material that is crucial in many materials and engineering applications.
我们的科学家团队拥有各种研究领域经验，包括生命科学、材料科学、化学合成、色谱、分析及许多其他领域.
联系客户支持