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Merck
CN

135623

Sigma-Aldrich

草酸二甲酯

ReagentPlus®, 99%

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别名:
Methyl oxalate
线性分子式:
CH3OCOCOOCH3
CAS号:
分子量:
118.09
Beilstein:
1071744
EC 号:
MDL编号:
UNSPSC代码:
12352100
PubChem化学物质编号:
NACRES:
NA.22

质量水平

产品线

ReagentPlus®

检测方案

99%

形式

powder

折射率

n20/D 1.39 (lit.)

bp

163.5 °C (lit.)

mp

50-54 °C (lit.)

溶解性

ethanol: soluble 50 mg/mL, clear to very slightly hazy, colorless

密度

1.148 g/mL at 25 °C (lit.)

SMILES字符串

COC(=O)C(=O)OC

InChI

1S/C4H6O4/c1-7-3(5)4(6)8-2/h1-2H3

InChI key

LOMVENUNSWAXEN-UHFFFAOYSA-N

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一般描述

草酸二甲酯经过 Cu/SiO2 催化的氢化反应,得到乙二醇。它经过Ag/SiO2 催化的选择性气相加氢反应,得到相应的醇

应用

草酸二甲酯(DMO)被用作直接氧化燃料电池中的替代燃料。DMO被用于研究在惰性气体低温基质中分离所得DMO的IR光谱

法律信息

ReagentPlus is a registered trademark of Merck KGaA, Darmstadt, Germany

象形图

CorrosionExclamation mark

警示用语:

Danger

危险声明

危险分类

Acute Tox. 4 Oral - Eye Dam. 1 - Skin Corr. 1B

WGK

WGK 3

闪点(°F)

closed cup

闪点(°C)

closed cup

个人防护装备

dust mask type N95 (US), Eyeshields, Gloves

法规信息

危险化学品

分析证书(COA)

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A1h NMR Pulse Gradient Spin-Echo (PGSE) Mass Transport Study of Dimethyl Oxalate and Ethylene Glycol: New Fuels for the DOFC.
Suarez-Gustave S, et al.
Electrochemical and Solid-State Letters, 12(3), 525-528 (2000)
Chao Wen et al.
Chemical communications (Cambridge, England), 49(45), 5195-5197 (2013-05-02)
The variation of the supports on the Cu/SiO2 catalyst plays an important role in the catalytic performance for hydrogenation of dimethyl oxalate. The loss of silica in the form of tetramethoxysilane from the support under the reaction conditions is responsible
Anyuan Yin et al.
Chemical communications (Cambridge, England), 46(24), 4348-4350 (2010-05-14)
Ag/SiO(2) prepared by a sol-gel process is highly effective for selective gas-phase hydrogenation of dimethyl oxalate to corresponding alcohols. The catalysts are of great potential as industrially viable and novel catalysts for the production of methyl glycolate and ethylene glycol.
Molecular structure and infrared spectra of dimethyl oxalate.
Lopes SB, et al.
Physical Chemistry Chemical Physics, 4(6), 1014-1020 (2002)

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