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  • Multiple pulse nanosecond laser induced damage study in LiB3O5 crystals.

Multiple pulse nanosecond laser induced damage study in LiB3O5 crystals.

Optics express (2011-01-05)
Frank R Wagner, Anne Hildenbrand, Jean-Yves Natoli, Mireille Commandré
摘要

Multiple pulse nanosecond laser induced damage in the bulk of LiB3O5 (LBO) crystals was investigated at 1064 nm, 532 nm and 355 nm. Scanning electron microscopy of cleaved damage sites confirmed the presence of different zones that have already been reported in the case of KH2PO4 (KDP). Multi pulse measurements reveal a strong decrease of the damage threshold with increasing pulse number at 1064 nm (fatigue effect). A weaker fatigue effect was observed at 532 nm and no fatigue effect was found at 355 nm. This observation is best explained by an inherently statistical light matter interaction generating laser induced damage. Finally, a polarization dependent damage threshold anisotropy was evidenced at all three wavelengths, being strongest at 1064 nm. The results indicate the importance of Li+ vacancy stabilized color centers for the damage mechanism.

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Sigma-Aldrich
四硼酸锂, ≥99.9% trace metals basis
Sigma-Aldrich
偏硼酸锂, 99.9% trace metals basis
Sigma-Aldrich
偏硼酸锂, ACS reagent, ≥98.0%
Sigma-Aldrich
四硼酸锂, ≥99.995% trace metals basis
Sigma-Aldrich
偏硼酸锂, 99.995% trace metals basis