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R2R Monolayer large grain CVD graphene on copper foil

A5 size, avg. no. of layers, 1

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Synonym(s):
Roll-to-Roll graphene
Linear Formula:
C
CAS Number:
1034343-98-0
UNSPSC Code:
12141908
NACRES:
NA.23

Quality Level

100

description

Growth method: roll-to-roll CVD
Raman intensity 2D/G: ≥1.5
Number of layer: Monolayer

feature

avg. no. of layers 1

sheet resistance

280 Ω/sq ±10%

size

110 μm × 110 μm ± 10%, grain size

thickness

35 μm , Cu Foil

surface coverage

surface coverage >98%

transmittance

>97%

semiconductor properties

(mobility>3000 cm2/V·s) (Hall effect measurements)

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General description

Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (∼110μm2) on copper foil, A5 size.

Application

Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.

This large grain size product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.

Application examples:
  • Ultrafast Transistor
  • Optical devices
  • Bio/Gas Sensor
  • Transparent Electrode
  • Flexible Display
  • Smart Coating
  • Thermal management

Caution

Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.

Storage and Stability

Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.

Legal Information

Product of LG Electronics, R&D use only

Pictograms

Environment
GHS09

Signal Word

Warning

Hazard Statements

H410

Precautionary Statements

P273 - P391 - P501

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1

WGK

WGK 2

Regulatory Information

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Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Hao-Ling Tang et al.
ACS nano, 11(12), 12817-12823 (2017-11-29)
Two-dimensional (2D) materials are drawing growing attention for next-generation electronics and optoelectronics owing to its atomic thickness and unique physical properties. One of the challenges posed by 2D materials is the large source/drain (S/D) series resistance due to their thinness
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain

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