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Merck
CN

Toward Mass Production of CVD Graphene Films.

Advanced materials (Deerfield Beach, Fla.) (2018-10-03)
Bing Deng, Zhongfan Liu, Hailin Peng
ABSTRACT

Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain sizes, uniform layers, fast growth, and low synthesis temperatures. Some attempts have been made by both the scientific community and startup companies to mass produce graphene films; however, there is a large difference in the quality of graphene synthesized on a laboratory scale and an industrial scale. Here, recent progress toward the mass production of CVD graphene films is summarized, including the manufacturing process, equipment, and critical process parameters. Moreover, the large-scale homogeneity of graphene films and fast characterization methods are also discussed, which are crucial for quality control in mass production.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
R2R Monolayer small grain CVD graphene on silicon wafer, 4 in diameter, avg. no. of layers, 1
Sigma-Aldrich
R2R Monolayer large grain CVD graphene on silicon wafer, 4 in diameter, avg. no. of layers, 1
Sigma-Aldrich
R2R Monolayer small grain CVD graphene on copper foil, A5 size
Sigma-Aldrich
R2R Monolayer large grain CVD graphene on silicon wafer, avg. no. of layers, 1, 6 in diameter
Sigma-Aldrich
R2R Monolayer large grain CVD graphene on copper foil, A5 size, avg. no. of layers, 1
Sigma-Aldrich
R2R Monolayer small grain CVD graphene on copper foil, A3 size, avg. no. of layers, 1
Sigma-Aldrich
R2R Monolayer large grain CVD graphene on copper foil, A3 size, avg. no. of layers, 1