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Key Documents
Safety Information
371904
1,3-Divinyltetramethyldisiloxane
97%
Synonym(s):
1,1,3,3-Tetramethyl-1,3-divinyldisiloxane
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25 ML
CN¥731.92
1 L
CN¥2,617.16
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25 ML
CN¥731.92
1 L
CN¥2,617.16
About This Item
Linear Formula:
[H2C=CHSi(CH3)2]2O
CAS Number:
Molecular Weight:
186.40
Beilstein:
1762585
EC Number:
MDL number:
UNSPSC Code:
12162002
PubChem Substance ID:
NACRES:
NA.23
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Assay
97%
form
liquid
refractive index
n20/D 1.411 (lit.)
bp
139 °C (lit.)
mp
−99 °C (lit.)
density
0.809 g/mL at 25 °C (lit.)
SMILES string
C[Si](C)(O[Si](C)(C)C=C)C=C
InChI
1S/C8H18OSi2/c1-7-10(3,4)9-11(5,6)8-2/h7-8H,1-2H2,3-6H3
InChI key
BITPLIXHRASDQB-UHFFFAOYSA-N
1 of 4
This Item | 741949 | 753629 | 753610 |
|---|---|---|---|
| concentration ~7.2E+10 particles/mL | concentration ~5.5E+13 particles/mL | concentration ~1.8E+11 particles/mL | concentration ~6.54E+11 particles/mL |
| OD 1 | OD 1 | OD 1 | OD 1 |
| diameter 40 nm | diameter 5 nm | diameter 30 nm | diameter 20 nm |
| λmax 526-531 nm | λmax 510-520 nm | λmax 523-526 nm | λmax 518-522 nm |
| storage temp. 2-8°C | storage temp. 2-8°C | storage temp. 2-8°C | storage temp. 2-8°C |
Application
- Synthesis and Studies on the Effect of Phenyl Side–Chain Content on Refractive Index of Polysiloxane Resin: This study used 1,3-divinyltetramethyldisiloxane as a terminating agent to modify polysiloxane resin properties (Ramli et al., 2015).
- Undecenoic Acid-Based Polydimethylsiloxanes Obtained by Hydrosilylation and Hydrothiolation Reactions: This paper explored the use of 1,3-divinyltetramethyldisiloxane as a blocking agent in the synthesis of polydimethylsiloxanes (Milenin et al., 2020).
- Efficient Improvement in Electrochemical Properties of High-Voltage Li-rich Mn-Based Layered Oxide Cathode by Addition of 1,3-divinyltetramethyldisiloxane: The additive 1,3-divinyltetramethyldisiloxane was used to enhance electrochemical properties of Li-rich layered oxide cathode (Huang et al., 2023).
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 3
Flash Point(F)
71.1 °F - closed cup
Flash Point(C)
21.7 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
Regulatory Information
危险化学品
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Seungmin Shin et al.
Nanotechnology, 27(47), 475301-475301 (2016-10-27)
Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into
B Sivaranjini et al.
Scientific reports, 8(1), 8891-8891 (2018-06-13)
A simple and effective approach for vertical alignment of liquid crystals (LCs) over a functionalized transparent flexible substrate is described. Surface characterization of this commercially available plastic substrate through X-ray photoelectron spectroscopy (XPS) and attenuated total reflection infrared spectroscopy (ATR-IR)
Ilya Borisov et al.
Polymers, 12(6) (2020-05-30)
For the first time, the effect of the side-chain in polyalkylmethylsiloxane towards pervaporative removal of methyl tert-butyl ether (MTBE) from water was studied. The noticeable enhancement of separation factor during the pervaporation of 1 wt.% MTBE solution in water through
Charles A Ault et al.
Macromolecular rapid communications, 42(5), e2000692-e2000692 (2021-01-28)
Effects of molecular weight of methylphenyl-containing vinylsiloxy-functionalized terpolysiloxanes on their UV-activated crosslinking by hydrosilylation at room temperature in air, shelf life stability of "all-in-one" pastes prepared from them for additive manufacturing, and mechanical properties of the resulting crosslinked elastomers, are
Katharina Thum et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 27(7), 2513-2522 (2020-11-17)
The first intermolecular early main group metal-alkene complexes were isolated. This was enabled by using highly Lewis acidic Mg centers in the Lewis base-free cations (Me BDI)Mg+ and (tBu BDI)Mg+ with B(C6 F5 )4 - counterions (Me BDI=CH[C(CH3 )N(DIPP)]2
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