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质量水平
方案
98%
表单
low-melting solid
反应适用性
core: platinum
mp
30-31 °C (lit.)
储存温度
2-8°C
SMILES字符串
C[Pt](C)C.C[C]1[CH][CH][CH][CH]1
InChI
1S/C6H7.3CH3.Pt/c1-6-4-2-3-5-6;;;;/h2,4H,3H2,1H3;3*1H3;
InChI key
AGQKROMSWCHOND-UHFFFAOYSA-N
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一般描述
Trimethyl(methylcyclopentadienyl)platinum(IV) is a crystalline organometallic precursor for platinum and is used in microelectronics, catalysis, photonics, and chemical sensing processes. It is also utilized as a precursor for preparing platinum nanoparticles, tuning particle size for better activity and stability of the platinum catalyst.
应用
Trimethyl(methylcyclopentadienyl)platinum(IV) can be used:
- As a precursor to deposit Pt on tungsten oxide surface by atomic layer deposition method. This acts as a hybrid anode catalyst for PEM fuel cells.
- To fabricate high performance and stable Si photocathode for solar water splitting reaction.
- As a precursor to deposit Pt nanoparticles on TiO2 nanotube films for highly efficient gas sensors. Pt nanoparticles significantly enhances the sensitivity.
警示用语:
Danger
危险分类
Acute Tox. 1 Oral - Acute Tox. 2 Dermal - Aquatic Acute 1 - Skin Sens. 1
储存分类代码
6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
WGK
WGK 3
闪点(°F)
131.0 °F - closed cup
闪点(°C)
55 °C - closed cup
个人防护装备
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
Nanostructured Platinum Catalysts by Atomic-Layer Deposition for Solid-Oxide Fuel Cells
Advanced Energy Materials, 2(6), 651-654 (2012)
Electron induced surface reactions of the organometallic precursor trimethyl (methylcyclopentadienyl) platinum (IV).
The Journal of Physical Chemistry C, 113(6), 2487-2496 (2009)
商品
Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
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