选择尺寸
关于此项目
产品名称
四氯化硅, 99.998% trace metals basis
InChI key
FDNAPBUWERUEDA-UHFFFAOYSA-N
InChI
1S/Cl4Si/c1-5(2,3)4
SMILES string
Cl[Si](Cl)(Cl)Cl
vapor density
5.86 (vs air)
vapor pressure
420 mmHg ( 37.7 °C)
assay
99.998% trace metals basis
form
liquid
reaction suitability
core: silicon
bp
57.6 °C (lit.)
mp
−70 °C (lit.)
density
1.483 g/mL at 25 °C (lit.)
Quality Level
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Application
Features and Benefits
- High Purity (99.998%): Ensures minimal contamination, crucial for optics and photonics applications
- Ideal for Semiconductor applications: Its ultra-high purity supports fabrication of advanced integrated circuits, wafers, and solar cells
General description
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Skin Corr. 1A - STOT SE 3
target_organs
Respiratory system
supp_hazards
存储类别
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles
法规信息
商品
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
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