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Merck
CN

160326

Sigma-Aldrich

4,4′-双(二乙氨基)苯甲酮

≥99%

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别名:
4,4′-双(二乙氨基)二苯甲酮, 4,4′-(四乙二氨基)二苯甲酮, , ′-四乙基二氨基二苯甲酮, 双[4-(二乙氨基)苯基]甲酮, 四乙基米氏酮′
线性分子式:
[(C2H5)2NC6H4]2CO
CAS号:
分子量:
324.46
Beilstein:
2148611
EC 号:
MDL编号:
UNSPSC代码:
12162002
PubChem化学物质编号:
NACRES:
NA.23

质量水平

检测方案

≥99%

mp

89-92 °C (lit.)

SMILES字符串

CCN(CC)c1ccc(cc1)C(=O)c2ccc(cc2)N(CC)CC

InChI

1S/C21H28N2O/c1-5-22(6-2)19-13-9-17(10-14-19)21(24)18-11-15-20(16-12-18)23(7-3)8-4/h9-16H,5-8H2,1-4H3

InChI key

VYHBFRJRBHMIQZ-UHFFFAOYSA-N

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应用

  • The effect of 4, 4′-bis (N, N-diethylamino) benzophenone on the degree of conversion in liquid photopolymer for dental 3D printing: Examines its use as a co-initiator in dental 3D printing materials (DH Lee et al., 2015).
  • Ketone Number and Substitution Effect of Benzophenone Derivatives on the Free Radical Photopolymerization: Compares its performance with other photoinitiators in polymerization (TL Huang, YC Chen, 2021).
  • Michler′s ethylketone as a novel negative-ion matrix for the enhancement of lipid MALDI tissue imaging: Uses 4,4′-bis(diethylamino)benzophenone in matrix-assisted laser desorption/ionization (MALDI) for tissue imaging (Y Shi et al., 2022).

WGK

WGK 2

闪点(°F)

Not applicable

闪点(°C)

Not applicable

个人防护装备

dust mask type N95 (US), Eyeshields, Gloves

法规信息

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Thi Kim Hoang Trinh et al.
Chemistry (Weinheim an der Bergstrasse, Germany), 25(39), 9242-9252 (2019-04-26)
In the search of smarter routes to control the conditions of N-heterocyclic carbene (NHCs) formation, a two-component air-stable NHC photogenerating system is reported. It relies on the irradiation at 365 nm of a mixture of 2-isopropylthioxanthone (ITX) with 1,3-bis(mesityl)imidazoli(ni)um tetraphenylborate. The

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