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Key Documents

0712410

Sigma-Aldrich

2-(2-Nitrophenyl)propyl chloroformate

~95% chlorine basis

Synonym(s):

NPPOC chloride

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About This Item

Empirical Formula (Hill Notation):
C10H10ClNO4
Molecular Weight:
243.64
Beilstein:
7642748
MDL number:
UNSPSC Code:
12352200
PubChem Substance ID:
NACRES:
NA.03

Assay

~95% chlorine basis

storage temp.

−20°C

SMILES string

CC(COC(Cl)=O)c1ccccc1[N+]([O-])=O

InChI

1S/C10H10ClNO4/c1-7(6-16-10(11)13)8-4-2-3-5-9(8)12(14)15/h2-5,7H,6H2,1H3

InChI key

LRWLGGPRIFYAPO-UHFFFAOYSA-N

Other Notes

Reagent for the introduction of the photolabile NPPOC protective group

Pictograms

Skull and crossbonesCorrosion

Signal Word

Danger

Hazard Statements

Hazard Classifications

Acute Tox. 3 Oral - Skin Corr. 1B

Storage Class Code

6.1A - Combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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W. Pfleiderer et al.
Tetrahedron Letters, 53, 4247-4247 (1997)
M Beier et al.
Nucleic acids research, 28(4), E11-E11 (2000-01-29)
For DNA chip analyses, oligonucleotide quality has immense consequences for accuracy, sensitivity and dynamic range. The quality of chips produced by photolithographic in situ synthesis depends critically on the efficiency of photo-deprotection. By means of base-assisted enhancement of this process

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