08729
Silicon Standard for ICP
TraceCERT®, 1 g/L Si in nitric acid (nominal concentration)
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About This Item
grade
certified reference material
TraceCERT®
Quality Level
product line
TraceCERT®
concentration
1 g/L Si in nitric acid (nominal concentration)
technique(s)
ICP: suitable
application(s)
industrial qc
pharmaceutical
format
single component solution
Related Categories
General description
This certified reference material (CRM) is produced in accordance with ISO 17034 and characterized in accordance with ISO/IEC 17025. This CRM is traceable to SI unit kg and measured against primary material from a National Metrology Institute (NMI), e.g. NIST.
Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.
Download your certificate at https://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.
Please visit ISO certificates and Site Quality Self-Assessments to access the current certificates of accreditation.
Download your certificate at https://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.
Application
Silicon ICP standard can be used as a calibration standard in the determination of silicon concentration in organosilica materials by inductively coupled plasma optical emission spectroscopy (ICP-OES).
Analysis Note
1 g/L Si in 2% HNO3 (contains HF traces), prepared with high purity Si, HNO3, HF, and water
Other Notes
For a complete product listing of our TraceCERT® range of CRMs for ICP and AAS, technical information and example certificates please visit our ICP & AAS standards website
Legal Information
TraceCERT is a registered trademark of Merck KGaA, Darmstadt, Germany
Signal Word
Warning
Hazard Statements
Precautionary Statements
Hazard Classifications
Eye Irrit. 2 - Met. Corr. 1 - Skin Irrit. 2
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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Influence of monomer connectivity, network flexibility, and hydrophobicity on the hydrothermal stability of organosilicas
Langmuir, 33, 5527-5536 (2017)
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