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Merck
CN

93412

Tris(trimethylsilyl) phosphite

≥95.0% (GC)

Synonym(s):

Trimethylsilanol phosphite, Tris(trimethylsilyloxy)phosphine

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About This Item

Linear Formula:
[(CH3)3SiO]3P
CAS Number:
1795-31-9
Molecular Weight:
298.54
Beilstein:
2043814
MDL number:
MFCD00015588
UNSPSC Code:
12352100
PubChem Substance ID:
57653555
NACRES:
NA.22

Key Documents

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Quality Level

100

Assay

≥95.0% (GC)

form

liquid

refractive index

n20/D 1.409 (lit.)

bp

78-81 °C/8 mmHg (lit.)

density

0.893 g/mL at 25 °C (lit.)

SMILES string

C[Si](C)(C)OP(O[Si](C)(C)C)O[Si](C)(C)C

InChI

1S/C9H27O3PSi3/c1-14(2,3)10-13(11-15(4,5)6)12-16(7,8)9/h1-9H3

InChI key

VMZOBROUFBEGAR-UHFFFAOYSA-N

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General description

Tris(trimethylsilyl)phosphate is tris(trimethylsilyl)ester of phosphoric acid. It is an important raw material and intermediate inorganic synthesis. It is used in the preparation of bis(trimethylsilyl)phosphonate esters by the Arbuzov reaction with halogen-containing compounds.

Application

Tris(trimethylsilyl) phosphite is used as a:
  • Film-forming additive to enhance the electrochemical performance of the NMC811[LiNi0.8Mn0.1Co0.1O2]/Si-Grcell.

Other Notes

Reagent used for the mild preparation of bis(TMS) phosphonates (Arbuzow reaction); Review

Pictograms

Exclamation mark
GHS07

Signal Word

Warning

Hazard Statements

H315,H319

Hazard Classifications

Eye Irrit. 2 - Skin Irrit. 2

Storage Class Code

10 - Combustible liquids

WGK

WGK 3

Flash Point(F)

235.4 °F - closed cup

Flash Point(C)

113 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

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Certificates of Analysis (COA)

Lot/Batch Number
BCCK6472
BCCJ2909
BCCJ0464
BCCJ0456
BCCD7314

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M. Sekine et al.
The Journal of Organic Chemistry, 46, 2097-2097 (1981)
L.E. Dreef et al.
Tetrahedron Letters, 29, 1199-1199 (1988)
Understanding the Roles of Tris (trimethylsilyl) Phosphite (TMSPi) in LiNi0. 8Mn0. 1Co0. 1O2 (NMC811)/Silicon--Graphite (Si--Gr) Lithium-Ion Batteries
Liu H, et al.
Advanced Materials Interfaces, 7(15), 2000277-2000277 (2020)
Tris (trimethylsilyl) Phosphite
Bittman R
Encyclopedia of Reagents for Organic Synthesis, Second Edition (2001)
Thomas G Pattison et al.
ACS nano, 14(4), 4276-4288 (2020-03-14)
The area selective growth of polymers and their use as inhibiting layers for inorganic film depositions may provide a valuable self-aligned process for fabrication. Polynorbornene (PNB) thin films were grown from surface-bound initiators and show inhibitory properties against the atomic
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