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About This Item
Product Name
Monolayer hexagonal Boron Nitride (hBN) on Si/SiO2 wafer, diam. 100 mm (4 in.)
SMILES string
B#N
InChI
1S/BN/c1-2
InChI key
PZNSFCLAULLKQX-UHFFFAOYSA-N
description
Monolayer h-BN
hBN Coverage: 100% with sporadic adlayers
Bandgap: 5.97 eV
Raman Peak: 1370 /cm-1
Orientation: <1-0-0>
Metal Impurities: 1.00e10 – 5.00e10 (at/cm2)
Substrate
Type/Doping: P/B
Wafer Thickness : 500 ± 50 μm
Oxide Thickness: 300 nm
Resistivity: 1 – 10 (ohm/cm)
diam.
100 mm (4 in.)
grain size
>4 μm
Quality Level
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Application
- Two-dimensional electronics
- Nanophotonic and other optoelectronic devices
- Quantum communication and information science
- Aerospace industry
- MEMS and NEMS
- Micro-/nano- actuators
- Insulating/transparent coatings.
Preparation Note
Storage Class
13 - Non Combustible Solids
wgk
WGK 3
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