87921
Tetramethylsilane
≥99.0% (GC)
Synonym(s):
TMS
Sign In to View Organizational & Contract Pricing.
Select a Size
About This Item
Linear Formula:
Si(CH3)4
CAS Number:
Molecular Weight:
88.22
UNSPSC Code:
12352103
NACRES:
NA.22
PubChem Substance ID:
EC Number:
200-899-1
Beilstein/REAXYS Number:
1696908
MDL number:
Assay:
≥99.0% (GC)
Technique(s):
GC/GC: suitable
Bp:
26-28 °C (lit.)
Vapor pressure:
11.66 psi ( 20 °C)
Product Name
Tetramethylsilane, ≥99.0% (GC)
autoignition temp.
842 °F
InChI key
CZDYPVPMEAXLPK-UHFFFAOYSA-N
InChI
1S/C4H12Si/c1-5(2,3)4/h1-4H3
SMILES string
C[Si](C)(C)C
vapor pressure
11.66 psi ( 20 °C)
assay
≥99.0% (GC)
form
liquid
technique(s)
GC/GC: suitable
refractive index
n20/D 1.358 (lit.)
n20/D 1.359
bp
26-28 °C (lit.)
mp
−99 °C (lit.)
density
0.648 g/mL at 25 °C (lit.)
storage temp.
2-8°C
Quality Level
Looking for similar products? Visit Product Comparison Guide
Application
Tetramethylsilane can be used as a silicon precursor for the synthesis of silicon doped diamond-like carbon (DLC-Si) films and silicon carbide (SiC) bulk crystals. It can also be used as a hydrocarbon substrate to study intermolecular C-H activation chemistry.
signalword
Danger
hcodes
Hazard Classifications
Flam. Liq. 1
Storage Class
3 - Flammable liquids
wgk
WGK 3
flash_point_f
-16.6 °F - closed cup
flash_point_c
-27 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves
Regulatory Information
危险化学品
This item has
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Intermolecular C- H Activation of Hydrocarbons by Tungsten Alkylidene Complexes: An Experimental and Computational Mechanistic Study.
Adams CS, et al.
Organometallics, 20(23), 4939-4955 (2001)
The mechanical and biocompatibility properties of DLC-Si films prepared by pulsed DC plasma activated chemical vapor deposition.
Bendavid A, et al.
Diamond and Related Materials, 16(8), 1616-1622 (2007)
The effects of Si incorporation on the electrochemical and nanomechanical properties of DLC thin films.
Papakonstantinou P, et al.
Diamond and Related Materials, 11(3-6), 1074-1080 (2002)
High-temperature chemical vapor deposition for SiC single crystal bulk growth using tetramethylsilane as a precursor.
Nam DH, et al.
Crystal Growth & Design, 14(11), 5569-5574 (2014)
Maria T Proetto et al.
ChemMedChem, 9(6), 1176-1187 (2014-05-23)
A series of methoxy- and fluorine-substituted [salophene]platinum(II) complexes (salophene=N,N'-bis(salicylidene)-1,2-phenylenediamine) were synthesized and characterized by (1) H NMR spectroscopy and mass spectrometry. The structure was confirmed on the example of [5-OCH3 -salophene]platinum(II) (4-Pt) by crystal structure analysis. The cytotoxicity of all
Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.
Contact Technical Service