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767514

Sigma-Aldrich

Tantalum

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Synonym(s):

Ta

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About This Item

Empirical Formula (Hill Notation):
Ta
CAS Number:
7440-25-7
Molecular Weight:
180.95
EC Number:
231-135-5
MDL number:
MFCD00011252
UNSPSC Code:
12352103
PubChem Substance ID:
329767321
NACRES:
NA.23

vapor pressure

<0.01 mmHg ( 537.2 °C)

Assay

99.95% trace metals basis

form

foil

autoignition temp.

572 °F

reaction suitability

core: tantalum

resistivity

13.5 μΩ-cm, 20°C

diam. × thickness

2.00 in. × 0.25 in.

bp

5425 °C (lit.)

mp

2996 °C (lit.)

density

16.69 g/cm3 (lit.)

SMILES string

[Ta]

InChI

1S/Ta

InChI key

GUVRBAGPIYLISA-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Storage Class Code

11 - Combustible Solids

WGK

nwg

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

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Kostantinidis; S.;
The European Physical Journal - Applied Physics, 56(2), 24002/1-24002/1 (2011)
Helmersson; U.;
Thin Solid Films, 513(1-2), 1-1 (2006)
Giulio Maccauro et al.
Recent patents on biotechnology, 3(3), 157-165 (2009-06-24)
Tantalum is obtained from the minerals colombite, tantalite and euxenite. It is greyish silver, heavy and very hard. Tantalum does not react with body fluids and is used to make surgical equipment. Tantalum also does not irritate the body and
Juncai Deng et al.
Sheng wu yi xue gong cheng xue za zhi = Journal of biomedical engineering = Shengwu yixue gongchengxue zazhi, 28(2), 419-422 (2011-05-25)
This paper describes the biological characteristics of the metal tantalum (Ts) and the application status of tantalum in artificial joints, bone necrosis, spine, defects of bone and other aspects of bone. The early clinical application results of tantalum in bone
Jian Lu et al.
Zhongguo xiu fu chong jian wai ke za zhi = Zhongguo xiufu chongjian waike zazhi = Chinese journal of reparative and reconstructive surgery, 26(2), 244-247 (2012-03-13)
To review the progress in the treatment of bone defect by porous tantalum implant. Recent literature was extensively reviewed and summarized, concerning the treatment method of bone defect by porous tantalum implant. By right of their unique properties, porous tantalum
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