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759414

Sigma-Aldrich

Tetraethyl orthosilicate

packaged for use in deposition systems

Synonym(s):

Tetraethyl orthosilicate, Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate, TEOS

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About This Item

Linear Formula:
Si(OC2H5)4
CAS Number:
78-10-4
Molecular Weight:
208.33
Beilstein:
1422225
EC Number:
201-083-8
MDL number:
MFCD00009062
UNSPSC Code:
12352103
PubChem Substance ID:
329766783
NACRES:
NA.23

vapor density

7.2 (vs air)

Quality Level

100

vapor pressure

<1 mmHg ( 20 °C)

Assay

≥99.5% (GC)

form

liquid

refractive index

n20/D 1.382 (lit.)

bp

168 °C (lit.)

density

0.933 g/mL at 20 °C (lit.)

SMILES string

CCO[Si](OCC)(OCC)OCC

InChI

1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3

InChI key

BOTDANWDWHJENH-UHFFFAOYSA-N

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Application

Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:
  • Si oxide
  • Oxycarbide
  • Doped silicate
  • Silanol
  • Siloxane polymer
  • Organosilicon thin films

The films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
Commonly used as a precursor to prepare xerogel
Will interact with dodecylamine in the formation of intercalation compounds of H+-magadiite and used in a study of mixed-metal bioactive glasses.

Pictograms

FlameExclamation mark
GHS02,GHS07

Signal Word

Warning

Hazard Statements

H226,H319,H332,H335

Hazard Classifications

Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3

Target Organs

Respiratory system

WGK

WGK 1

Flash Point(F)

113.0 °F

Flash Point(C)

45 °C

Regulatory Information

危险化学品

Certificates of Analysis (COA)

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  1. Which document(s) contains shelf-life or expiration date information for a given product?

    If available for a given product, the recommended re-test date or the expiration date can be found on the Certificate of Analysis.

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Andreas Kay et al.
Journal of the American Chemical Society, 128(49), 15714-15721 (2006-12-07)
Thin films of silicon-doped Fe2O3 were deposited by APCVD (atmospheric pressure chemical vapor deposition) from Fe(CO)5 and TEOS (tetraethoxysilane) on SnO2-coated glass at 415 degrees C. HRSEM reveals a highly developed dendritic nanostructure of 500 nm thickness having a feature
Lin Lin et al.
Colloids and surfaces. B, Biointerfaces, 101, 97-100 (2012-07-17)
Hollow silica spheres with round mesoporous shells were synthesized by core-shell template method, using monodispersed cationic polystyrene particles as core, and TEOS (tetraethoxysilane) as the silica source to form shell. After calcination at 550°C, uniform spheres with a thin shell
Tom Hasell et al.
Advanced materials (Deerfield Beach, Fla.), 24(42), 5732-5737 (2012-08-30)
Macroscopic inorganic porous beads are imbibed with a "porous molecular additive" by simple solution processing techniques, resulting in controllable loading and increased surface area. The porous additive consists of soluble organic cage molecules that precipitate as microporous crystals when solutions
Xiao-Ming Zhu et al.
International journal of nanomedicine, 7, 953-964 (2012-03-07)
To compare the cellular uptake efficiency and cytotoxicity of aminosilane (SiO(2)-NH(2))-coated superparamagnetic iron oxide (SPIO@SiO(2)-NH(2)) nanoparticles with three other types of SPIO nanoparticles coated with SiO(2) (SPIO@SiO(2)), dextran (SPIO@dextran), or bare SPIO in mammalian cell lines. Four types of monodispersed
Evan M Hetrick et al.
Biomaterials, 30(14), 2782-2789 (2009-02-24)
The ability of nitric oxide (NO)-releasing silica nanoparticles to kill biofilm-based microbial cells is reported. Biofilms of Pseudomonas aeruginosa, Escherichia coli, Staphylococcus aureus, Staphylococcus epidermidis, and Candida albicans were formed in vitro and exposed to NO-releasing silica nanoparticles. Replicative viability
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