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749060

Sigma-Aldrich

Zinc

sputtering target, diam. × thickness 3.00 in. × 0.125 in., 99.995% trace metals basis

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About This Item

Empirical Formula (Hill Notation):
Zn
CAS Number:
7440-66-6
Molecular Weight:
65.39
EC Number:
231-175-3
MDL number:
MFCD00011291
UNSPSC Code:
12352103
PubChem Substance ID:
329765962
NACRES:
NA.23

vapor pressure

1 mmHg ( 487 °C)

Assay

99.995% trace metals basis

form

solid

resistivity

5.8 μΩ-cm, 20°C

diam. × thickness

3.00 in. × 0.125 in.

bp

907 °C (lit.)

mp

420 °C (lit.)

density

7.133 g/mL at 25 °C (lit.)

SMILES string

[Zn]

InChI

1S/Zn

InChI key

HCHKCACWOHOZIP-UHFFFAOYSA-N

Application

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques.

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Regulatory Information

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Certificates of Analysis (COA)

Lot/Batch Number
MKCV1187
MKCV1188

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Dahn, J. R.; Trussler, S.; Hatchard, T. D.; Bonakdarpour, B. et al.
Chemistry of Materials, 14, 3519-3519 (2002)
Oechsner, H.
Applied Physics. A, Materials Science & Processing, 8, 185-185 (1975)
Hahn, H.; Averback, R. S.
Journal of Applied Physics, 67, 1113-1113 (1990)
Sigmund, P.
Physical Review, 184, 383-383 (1969)
Sara Eyal et al.
Journal of nuclear medicine : official publication, Society of Nuclear Medicine, 50(5), 798-806 (2009-05-01)
Studies in rodents indicate that the disruption of P-glycoprotein (P-gp) function increases drug distribution into the developing fetus and organs such as the brain. To simultaneously and serially evaluate the effect of P-gp activity and inhibition on the tissue distribution
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