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About This Item
vapor density
3.7 (vs air)
Quality Level
vapor pressure
1.08 mmHg ( 100 °C)
description
anti-fade reagent
Assay
≥99%
form
sublimed
bp
267 °C (lit.)
mp
138-143 °C (lit.)
SMILES string
Nc1ccc(N)cc1
InChI
1S/C6H8N2/c7-5-1-2-6(8)4-3-5/h1-4H,7-8H2
InChI key
CBCKQZAAMUWICA-UHFFFAOYSA-N
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Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Skin Sens. 1 - STOT SE 1 Oral
Target Organs
Kidney,Heart,Musculo-skeletal system
Storage Class Code
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
WGK
WGK 3
Flash Point(F)
230.0 °F - closed cup
Flash Point(C)
110 °C - closed cup
Personal Protective Equipment
Regulatory Information
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Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.
近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
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